Journal of Vacuum Science & Technology A Editors

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Eray S. AydilEray S. Aydil

Professor Eray S. Aydil is the Ronald L. and Janet A. Christenson Chair in Renewable Energy and Executive Officer of the Department of Chemical Engineering and Materials Science at the University of Minnesota. He is a Fellow of the American Vacuum Society and Editor-in-Chief of the Journal of Vacuum Science and Technology. He received his B.S. degrees in chemical engineering and in materials science and engineering, both from U. C. Berkeley in 1986. He received his Ph.D. degree in chemical engineering in 1991 from the University of Houston. He was a postdoc at Bell Labs until 1993 when he joined the faculty of the chemical engineering department at U.C. Santa Barbara as an assistant professor. By the time he left U.C. Santa Barbara in 2005 for University of Minnesota, he was a full professor and vice chairman. In 2005, Professor Aydil joined the Department of Chemical Engineering and Materials Science at the University of Minnesota. He has published over 160 articles and holds 7 patents. In recognition of his research, he has received the Peter Mark Award and the Plasma Prize from the American Vacuum Society, the Norman Hackerman Young Author Award of the Electrochemical Society, the National Young Investigator Award of the National Science Foundation, and the Camille-Dreyfus Teacher-Scholar Award.

Jane Chang

Jane Chang is an Associate Dean at UCLA Henry Samueli School of Engineering and Apllied Science and a Professor in the Chemical and Biomedical Engineering Department. Her educational background includes a Bachelor of Science degree from National Taiwan University, 1993, a M.S. from Massachusetts Institute of Technology, 1995 and a Ph.D. from Massachusetts Institute of Technology, 1998. Her awards and recognitions include: Rumbel Fellowship, MIT, 1993; AVS Coburn and Winters Award, 1996; NSF Faculty Career Award, 2000-2004; Chancellor's Career Development Award, 2000-2004; William F. Seyer Chair in Materials Electrochemistry, 2000-; TRW Excellence in Teaching Award, 2002; ONR Young Investigator Award, 2003; Teacher of the Year, Chemical Engineering, UCLA, 2003; Professor of the Year, Chemical Engineering, UCLA, 2004; AVS Peter Mark Award, 2005; Professor of the Year, Chemical Engineering, UCLA, 2009 and AVS Fellow, 2013.

Professor Chang’s research interests include: Plasma chemistries and surface kinetics; atomic layer deposition of complex and multifunctional oxide materials; semiconductor processing and chemistry; computational surface chemistry; and nanostructured complex oxides.

James R. Engstrom

James R. Engstrom is currently the BP Amoco/H. Laurance Fuller Professor in the School of Chemical and Biomolecular Engineering at Cornell University. He earned a B.S. degree in chemical engineering from the University of Minnesota in 1981and a Ph.D. degree in chemical engineering from the California Institute of Technology in 1987. From 1987-89 he was a postdoctoral research associate in the Department of Chemistry at the University of Washington. He joined the faculty at Cornell in 1990. Since 2002 he has also been a member of the Graduate Field of Chemistry and Chemical Biology. Prof. Engstrom is the recipient of numerous awards, including, in 1991, a NSF Presidential Young Investigator Award. In 2005 he was made a Fellow of the American Vacuum Society. From 1998 to 2001, he worked for Symyx Technologies, where he was vice president of high-throughput screening and electronic materials. Prof. Engstrom has been conducting research in the area of surface science and thin film deposition for over 25 years. This work, documented in over 85 publications, 115 contributed and 90 invited presentations, and 11 US patents, includes work in a variety of technologies ranging from heterogeneous catalysis, to semiconductor device manufacture, to thin film photovoltaic devices. Much of his work has involved fundamental studies of gas-surface reactions employing supersonic molecular beams, photoelectron spectroscopy, and X-ray synchrotron radiation. Presently, Professor Engstrom's research is focusing in three areas: controlling thin film nucleation in nanoscale electronics using techniques such as atomic layer deposition; organic thin film electronics, using in situ real time X-ray synchrotron radiation; and modification and processing of inorganic nanocrystalline materials.

William Hinsberg

William Hinsberg received his doctorate degree in Chemistry at the California Institute of Technology, and carried out postdoctoral work at Stanford University. In 1982, he joined IBM's General Products Division, working in thin-film process chemistry for magnetic recording devices. He moved to IBM's Research Division in 1983 to study the chemistry of new photoresist materials, serving twice as manager of the Lithography Materials group at the IBM Almaden Research Center. Currently he is founder and president of Columbia Hill Technical Consulting.

Four photoresists developed by Dr. Hinsberg and co-workers have been used for the commercial manufacture of microelectronic devices. He has received a number of awards from IBM for his technical work, including his selection as a Top Inventor, and a Corporate Award for the development of stochastic chemical kinetics simulation methods. He has published more than 150 scientific papers, and is inventor on more than thirty issued US patents. Dr Hinsberg is a recipient of the Leo J. Friend Award sponsored by the Industrial and Engineering Chemistry Section of the American Chemical Society. He also received the Award for Chemical Engineering Excellence from the American Institute of Chemical Engineers.

Eric Kay

After studying at the University of California, Berkeley and U. of Washington, Eric received his PhD in Physical Chemistry in 1958. He then spent the early years of his career as a Research Staff Member at IBM Research, San Jose, CA doing pioneering research in the science of sputtering. In subsequent years he built up and managed several research groups encompassing a broad spectrum of competence in Surface, Thin Film, Radiation and Plasma Science as well as Interfacial Electrochemistry and Tribology. After retiring as a Senior Manager from the IBM Almaden Research Center in 1991 he joined the Stanford University Faculty as a Consulting Professor in the Material Science and Engineering Department. During his 33 year career at IBM, he spent three 1 year Sabbaticals at various universities--1968/69, UC Berkeley; 1987/88 Univ. Heidelberg and 1990/92 Univ. Karlsruhe.

Research Interests: His personal research has centered around plasma, thin film and surface science with the most recent emphasis in two distinct areas: 1, Surface versus bulk magnetism using in situ spin polarized electron spectroscopies as well as Kerr magneto optical magnetometry during ion beam sputtered thin film growth. Interlayer magnetic exchange coupling mechanisms in various film assemblies have been of primary interest. 2, Plasma synthesis of granular composite metal/polymer thin films and the study of their unique electrical, optical, magnetic and mechanical properties above and below the onset of percolation. Relevance of various Effective Medium Theories is of special interest as well as exploration of various applications.

Professional interests and awards: He is the author of 7 book chapters, 175 technical papers, and 12 patents. He is a Fellow of the American Physical Society and American Vacuum Society as well as an Honorary Member of the AVS. He was the first recipient of the John Thornton Memorial AVS Award as well as the recipient of a US Senior Scientist von Humboldt Award. He is also the recipient of an Honorary Doctorate (Dr.rer.nat.hc.) from the University of Karlsruhe, Germany. He has served as Conference Chairman of the American Physical Society -"'Thin Film Phenomena" 1973; First Gordon Conference on "Organic Thin Films and Solid Surfaces" 1977; Intl. Conference on Topics in Surface Chemistry; 1977. Over the years, he has also served on Technical Review Panels of Argonne Natl. Labs, Mat. Sci.& Tech. Division; NIST, Surface Science; Materials Res .Ctr. Carnegie Mellon University; Nano-Fabrication Ctr. Cornell Univ.; Thin Film Consortia, Linköping, Uppsala, Stockholm; Inst. fuer Mikrostruktur Technick, Forschungszentrum, Karlsruhe. In the past, he has served on the Editorial Boards of Appl. Phys. A -Solids & Surfaces; Surface Science Reports; Applied Surface Science; Plasma Chemistry and Engineering. He is presently an Associate Editor of JVST A&B, Critical Reviews.

Gary E. McGuire

Gary E. McGuire is the President of the International Technology Center, a non-profit research company. He has served in many capacities within the AVS including President, Board of Directors, Trustees, Chair and Treasurer of the Electronic Materials and Processing Division and Executive Committee of the Surface Engineering Division. He is Past Editor of JVSTB and currently Associate Editor, Past Editor of the Journal of Electron Spectroscopy and Related Phenomena and currently Honorary Board Member, inaugural Editor of Surface Science Spectra, member Editorial Board of Critical Reviews in Solid State and Materials Science, and previously on the Editorial Board of Journal of Surface and Interface Analysis. He received his Ph.D. from the University of Tennessee then spent a year as a Post-doctoral scientist at Oak Ridge National Laboratory. He was a member of the technical staff at Texas Instruments before joining Tektronix as Manager of the Materials Development and Characterization Laboratory. He later became Director of Electronic Materials and Devices of the Microelectronic Center of North Carolina before founding ITC. He has published over 130 papers related to his research and has edited or authored 36 books and book chapters. He has been awarded 23 patents and received recognition from the Semiconductor Research Corporation Recognition Award for his patent “Method of Forming Metal-Disilicide Films from Silicon-on-Insulator Substrates.”

R. Mohan Sankaran

R. Mohan Sankaran is a Professor in the Department of Chemical Engineering at Case Western Reserve University in Cleveland, Ohio. He has a secondary appointment in the Department of Materials Science and Engineering, and is the Co-Director of the Swagelok Center for Surface Analysis of Materials (SCSAM). He received his B.S. degree in Chemical Engineering from the University of California at Los Angeles in 1998 and his Ph.D. degree in Chemical Engineering from the California Institute of Technology in 2004. In 2005, he joined the faculty of Case Western Reserve University as the John C. Angus Legacy Assistant Professor. He was promoted with tenure in 2010 and promoted to full professor in 2014. His current research interests include microplasmas, aerosol nanoparticle synthesis, catalytic growth of one-dimensional nanomaterials, and plasma-liquid chemistry. He has received the CAREER Award from the National Science Foundation, the Teacher-Scholar Award from the Camille and Henry Dreyfus Foundation, the Young Investigator Award from the Air Force Office of Scientific Research, and the Peter Mark Memorial Award from the American Vacuum Society.

Professor Colin Wolden

Professor Colin Wolden is the Weaver Distinguished Chair in the Department of Chemical and Biological Engineering at the Colorado School of Mines (CSM). He received his B.S. degree in chemical engineering in 1990 from the University of Minnesota. He completed his M.S. in chemical engineering practice in 1992 and received his Ph.D. degree in chemical engineering in 1995, both from the Massachusetts Institute of Technology. He was a National Research Council/Army Research Office postdoctoral fellow in the Department of Materials Science at North Carolina State University until 1997 when he joined the faculty of the chemical engineering department at CSM. He was promoted to full professor in 2007 and awarded the Weaver Chair in 2010. He has published over 80 articles and holds 2 patents. He has received the CAREER award from the National Science Foundation and in 2010 was awarded the E.T.S. Walton Visiting Fellowship from Science Foundation Ireland.

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Scitation: Journal of Vacuum Science & Technology A Editors