The relative sensitivity of thick dosimeters as a function of the field size and depth. Symbols: Measured data (Ref. 12), lines: MC simulated data. The measurement uncertainty is 2.5%.
Monte Carlo simulated dose to as a function of dosimeter thickness in a , field at a depth of , normalized to that of thick dosimeter.
Monte Carlo simulated dose profiles for films with thicknesses of 100, 10, and exposed by the beam at a depth and a field size of .
Monte Carlo simulated generated off-axis dose profiles at depths of 10, 20, and (a) and percentage depth dose profile (b) for a thick film for a field at in the beam.
Monte Carlo simulated dose profiles for a thick film and a thick film at depth of for a field at .
Monte Carlo simulated off-axis dose profiles at depths of 10, 20, and (a) and percentage depth dose profile (b) for a thick film for a field at in the beam coated on a thick substrate.
Mass attenuation coefficient as a function of the incident photon energy for KCl, , and (Ref. 28).
MC simulated absolute over-responses for films as a function of thickness at outside of a beam edge at depth. The asterisk refers to experimental data of other dosimeters from Schembri and Heijmen (Ref. 26) for comparison.
Sensitivity estimation for a thick at a dose-to-water of in .
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