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A maskless photolithographic prototyping system using a low-cost consumer projector and a microscope
1.J. D. Plummer, M. D. Deal, and P. B. Griffin, Silicon VLSI Technology (Prentice Hall, Upper Saddle River, NJ, 2000).
2.Handbook of Microlithography, Micromachining, and Microfabrication, edited by Rai Choudhury (SPIE, 1999), Vols. 1 and 2.
3.N. Choksi, D. S. Pickard, M. McCord, R. F. W. Pease, Y. Shroff, Y. Chen, W. Oldham, and D. Markle, “Maskless extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 17, 3047–3051 (1999).
4.The Micronic Laser Systems Sigma 7000 series uses a spatial light modulator consisting of over a million mirrors.
5.S. Singh-Gasson, R. D. Green, Y. Yuel, C. Nelson, F. Blattner, M. R. Sussman, and F. Cerrina, “Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array,” Nat. Biotechnol. 17, 974–978 (1999).
6.Plus Vision, model V-1080 (recently discontinued, but similar models exist).
7.L. J. Hornbeck, J. T. Carlo, M. W. Cowens, P. M. Osterberg, and M. M. DeSmith, “Deformable mirror projection display,” SID Int. Symp. Digest Tech. Papers 254, 228–229 (1980).
8.Texas Instruments, 〈http://www.dlp.com/dlp_technology/dlp_technology_overview.asp〉.
9.Nikon, model SMZ-10 (discontinued, but new similar models exist).
10.Nikon, model ME-600.
11.Nikon, Coolpix 900 series and 4500 series.
12.Optem International model 25-70-14 digital camera coupler.
13.Krups, model Combi Blender/Food Processor.
14.The Ocean Optics model S2000 spectrometer is not required for the lithography system, but is very useful for measuring reflectance spectra of thin films.
15.Ernest F. Fullam, Inc.
16.We used the using the image editing software PhotoEditor and Photoshop.
17.SPI Supplies Indium–Tin–Oxide (ITO) coated glass microscope slides.
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