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Electron caustic lithography
3.D. M. Tennant, in Nanotechnology, edited by G. Timp (Springer–Verlag, New York, 1999), pp. 161–205.
9.L. R. Harriott, in Proceedings of the Particle Accelerator Conference, New York, USA, 27 Mar – 02 Apr 1999, edited by A. Luccio and W. MacKay (IEEE, Piscataway, 1999), Vol. 1, pp. 595–599.
12.P. Petric, C. Bevis, A. Carroll, H. Percy, M. Zywno, K. Standiford, A. Brodie, N. Bareket, and L. Grella, J. Vac. Sci. Technol. B 27, 161 (2009).
13.P. Petric, C. Bevis, M. McCord, A. Carroll, A. Brodie, U. Ummethala, L. Grella, A. Cheung, and R. Freed, J. Vac. Sci. Technol. B 28, C6 (2010).
14.S. Eder-Kapl, E. Haugeneder, H. Langfischer, K. Reimer, J. Eichholz, M. Witt, H.-J. Doering, J. Heinitz, and C. Brandstaetter, Microelectron. Eng. 83, 968 (2006).
15.M. J. Wieland, G. de Boer, G. F. ten Berge, M. van Kervinck, R. Jager, J. J. M. Peijster, E. Slot, S. W. H. K. Steenbrink, T. F. Teepen, and B. J. Kampherbeek, Proc SPIE 7637, 7637–0F (2010).
17.D. E. Jesson and W. X. Tang, in Microscopy: Science, Technology, Applications and Education, edited by A. Méndez–Vilas and J. Díaz, (Formatex Research Center, Badajoz, 2010), Vol. 3, pp. 1608–1619.
19.M. V. Berry, in Physics of Defects, Les Houches Lecture Series Session XXXV edited by R. Balian, M. Kléman, and J.-P. Poirier (North–Holland, Amsterdam, 1981) p. 453.
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A maskless method of electron beamlithography is described which uses the reflection of an electron beam from an electrostaticmirror to produce caustics in the demagnified image projected onto a resist–coated wafer. By varying the electron optics, e.g. via objective lens defocus, both the morphology and dimensions of the caustic features may be controlled, producing a range of bright and tightly focused projected features. The method is illustrated for line and fold caustics and is complementary to other methods of reflective electron beamlithography.
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