No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Growth of SrTiO3
(110) film by oxide molecular beam epitaxy with feedback control
4. D. G. Schlom and J. S. Harris Jr., MBE Growth of High Tc Superconductors. in: Molecular Beam Epitaxy, edited by R. F. C. Farrow (Noyes, Park Ridge, 1995), pp. 505–622.
9. J. N. Eckstein, I. Bozovic, and G. F. Virshup, MRS Bull. 19, 44 (1994).
15. M. P. Warusawithana, C. Cen, C. R. Sleasman, J. C. Woicik, Y. Li, L. F. Kourkoutis, J. A. Klug, H. Li, P. Ryan, L. Wang, M. Bedzyk, D. A. Muller, L. Chen, J. Levy, and D. G. Schlom, Science 324, 367 (2009).
19. K. Ueno, S. Nakamura, H. Shimotani, A. Ohtomo, N. Kimura, T. Nojima, H. Aoki, Y. Iwasa, and M. Kawasaki, Nature Mater. 7, 855 (2008).
21. J. H. Haeni, P. Irvin, W. Chang, R. Uecker, P. Reiche, Y. L. Li, S. Choudhury, W. Tian, M. E. Hawley, B. Craigo, A. K. Tagantsev, X. Q. Pan, S. K. Steiffer, L. Q. Chen, S. W. Kirchoefer, J. Levy, and D. G. Schlom, Nature (London) 430, 758 (2004).
33. Zhiming Wang, Jiagui Feng, Yang Yang, Yuan Yao, Lin Gu, Fang Yang, Qinlin Guo, and Jiandong Guo, Appl. Phys. Lett. 100, 051602 (2012).
34. J. A. Enterkin, A. K. Subramanian, B. C. Russell, M. R. Castell, K. R. Poeppelmeier, and L. D. Marks, Nature Mater. 9, 245 (2010).
36. STM images are taken over different areas on the sample and the statistics indicate the uniformity of the entire surface.
37. A. Ichimiya and P. I. Cohen, Reflection high-energy electron diffraction (Cambridge University Press, 2004).
Article metrics loading...
By controlling the growth of complex oxide films with atomic precision, emergent phenomena and fascinating properties have been discovered, and even been manipulated. With oxide molecular beam epitaxy (OMBE) we grow high-quality SrTiO3(110) films by evaporating Sr and Ti metals with separate controls of the open/close timing of the shutters. The incident electron beam angle of the reflective high energy electron diffraction (RHEED) is adjusted to make the (01) beam sensitive to surface chemical concentration. By monitoring such an intensity, we tune the shutter timing to synchronize the evaporation amount of Sr and Ti in real-time. The intensity is further used as a feedback control signal for automatic growth optimization to fully compensate the possible fluctuation of the source flux rates upon extended growth. A 22 nm-thick film is obtained with the precision of metal cation stoichiometry better than 0.5%.
Full text loading...
Most read this month