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/content/aip/journal/adva/3/8/10.1063/1.4819455
2013-08-21
2016-12-06

Abstract

Zn ErAlO (0 ≤ y ≤ 0.04) thin films have been prepared by inductively coupled plasma enhanced physical vapor deposition method. It is found that Er substitutes Zn in ZnO lattice without forming any magnetic secondary phase. Al-doping has dual effects on the electron transport and magnetic properties of Er-doped ZnO films, wherein Al and Al play different roles. When 0 ≤ y ≤ 0.02, the dominant Al increases and induces both carrier concentration and saturation magnetization ( ) increasing. When 0.02 < y ≤ 0.04, Al becomes main defect and enhances the probability of electron scattering, thus reduces the .

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