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1.K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, M. I. Katsnelson, I. V. Grigorieva, S. V. Dubonos, and A. A. Firsov, Nature 438, 197 (2005).
2.K. Bolotin, K. Sikes, Z. Jiang, M. Klima, G. Fudenberg, J. Hone, P. Kim, and H. Stormer, Solid State Commun. 146, 351 (2008).
3.C. Lee, X. Wei, J. W. Kysar1, and J. Hone1, Science 321, 385 (2008).
4.A. A. Balandin, S. Ghosh, W. Bao, I. Calizo, D. Teweldebrhan, F. Miao, and C. N. Lau, Nano Lett. 8, 902 (2008).
5.W. Han, W. H. Wang, K. Pi, K. M. McCreary, W. Bao, Y. Li, F. Miao, C. N. Lau, and R. K. Kawakami, Phys. Rev. Lett. 102, 137205 (2009).
6.J. Abel, A. Matsubayashi, T. Murray, C. Dimitrakopoulos, D. B. Farmer, A. Afzali, A. Grill, C. Y. Sung, and V. P. LaBella, J. Vac. Sci. Technol. B 30, 04E109 (2012).
7.J. Abel, A. Matsubayashi, J. J. Garramone, and V. P. LaBella, J. Vac. Sci. Technol. B 30, 03D115 (2012).
8.N. Tombros, C. Jozsa, M. Popinciuc, H. T. Jonkman, and B. J. van Wees, Nature 448, 571 (2007).
9.Y. Zhang, Y. W. Tan, H. L. Stormer, and P. Kim, Nature 438, 201 (2005).
10.K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, and A. A. Firsov, Science 306, 666 (2004).
11.M. Xia, Z. Su, and S. Zhang, AIP Advances 2, 032122 (2012).
12.A. Pirkle, J. Chan, A. Venugopal, D. Hinojos, C. W. Magnuson, S. McDonnell, L. Colombo, E. M. Vogel, R. S. Ruoff, and R. M. Wallace, Appl. Phys. Lett. 99, 122108 (2011).
13.J. W. Suk, W. H. Lee, J. Lee, H. Chou, R. D. Piner, Y. Hao, D. Akinwande, and R. S. Ruoff, Nano Lett. 13, 1462 (2013).
14.D. Teweldebrhan and A. A. Balandina, Appl. Phys. Lett. 94, 013101 (2009).
15.I. Childres, L. A. Jauregui, M. Foxe4, J. Tian1, R. Jalilian1, I. Jovanovic, and Y. P. Chen1, Appl. Phys. Lett. 97, 173109 (2010).
16.G. Liu, D. Teweldebrhan, and A. A. Balandin, IEEE Trans. Nanotechnol. 10, 865 (2011).
17.S. Entani, S. Sakai, Y. Matsumoto, H. Naramoto, T. Hao, and Y. Maeda, J. Phys. Chem. C 114, 20042 (2010).
18.S. Entani, S. Sakai, Y. Matsumoto, H. Naramoto, T. Hao, and Y. Maeda, Jpn. J. Appl. Phys. 50, 04DN03 (2011).
19.A. C. Ferrari and D. M. Basko, Nature Nano. 8, 235 (2013).
20.M. S. Dresselhaus, A. Jorio, M. Hofmann, G. Dresselhaus, and R. Saito, Nano Lett. 10, 751 (2010).
21.J. W. Suk, A. Kitt, C. W. Magnuson, Y. Hao, S. Ahmed, J. An, A. K. Swan, B. B. Goldberg, and R. S. Ruoff, ACS Nano 5, 6916 (2011).
22.M. J. Rooks1, S. Wind1, P. McEuen1, and D. E. Prober1, J. Vac. Sci. Technol. B 5, 318 (1987).
23.A. Matsubayashi, J. Abel, D. P. Sinha, J. U. Lee, and V. P. LaBella, J. Vac. Sci. Technol. A 31, 021506 (2013).
24.C. Casiraghi, S. Pisana, K. S. Novoselov, A. K. Geim, and A. C. Ferrari, Appl. Phys. Lett. 91, 233108 (2007).
25.X. Li, W. Cai, J. An, S. Kim, J. Nah, D. Yang, R. Piner, A. Velamakanni, I. Jung, E. Tutuc et al., Science 324, 1312 (2009).
26.A. Das, S. Pisana, B. Chakraborty, S. Piscanec, S. K. Saha, U. V. Waghmare, K. S. Novoselov, H. R. Krishnamurthy, A. K. Geim, A. C. Ferrari et al., Nature Nano. 3, 210 (2008).

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The systematic Raman spectroscopic study of a “mimicked” graphene device fabrication is presented. Upon photoresist baking, compressive stress is induced in the graphene which disappears after it is removed. The indirect irradiation from the electron beam (through the photoresist) does not significantly alter graphene characteristic Raman peaks indicating that graphene quality is preserved upon the exposure. The 2D peak shifts and the intensity ratio of 2D and G band, I(2D)/I(G), decreases upon direct metal deposition (Co and Py) suggesting that the electronic modulation occurs due to sp2 C-C bond weakening. In contrast, a thin metal oxide film deposited graphene does not show either the significant 2D and G peaks shift or I(2D)/I(G) decrease upon the metal deposition suggesting the oxide protect the graphene quality in the fabrication process.


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