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A spin coated LaB discontinuous film is covered on MgO protective layer to improve the discharge performance of alternating current plasma display panels. Under the premise of high transmittance of more than 90%, a very small amount of polycrystal LaB powders added in an organic solvent are chosen as the coating solution. The discharge characteristics results show that with 250 torr 5% Xe-Ne pressure, the firing voltage and discharge delay time of the test panel with LaB/MgO double protective layer are decreased by 13.4% and 36.5%, respectively, compared with that of conventional MgO protective layer, likely owing to the low work function of LaB Furthermore, the aging time of the proposed structure is comparable to that of pure MgO protective layer. Therefore, it will not increase the production costs and is highly suitable to be applied for alternating current plasma display panels with low electrical power consumption.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd