Skip to main content
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
/content/aip/journal/adva/4/6/10.1063/1.4884175
1.
1. R. Rotzoll, S. Mohapatra, V. Olariu, R. Wenz, M. Grigas, K. Dimmler, O. Shchekin, and A. Dodabalapur, Appl. Phys. Lett. 88, 123502 (2006).
http://dx.doi.org/10.1063/1.2186384
2.
2. T. Someya, A. Dodabalapur, J. Huang, K. C. See, and H. E. Katz, Adv. Mater. 22, 3799 (2010).
http://dx.doi.org/10.1002/adma.200902760
3.
3. R. C. G. Naber, K. Asadi, P. W. M. Blom, D. M. de Leeuw, and B. de Boe, Adv. Mater. 22, 933 (2010).
http://dx.doi.org/10.1002/adma.200900759
4.
4. G. Schwartz, B. C.-K. Tee, J. Mei, A. L. Appleton, D. H. Kim, H. Wang, and Z. Bao, Nat. Commun. 4, 1859 (2012).
http://dx.doi.org/10.1038/ncomms2832
5.
5. C. Du, L. Li, W. Wang, J. Zhang, D. Yan, W. Hu, H. Fuchs, and L. Chi, AIP Advances 2, 022138 (2012).
http://dx.doi.org/10.1063/1.4723851
6.
6. X. G. Sun, L. Zhang, C. A. Di, Y. G. Wen, Y. L. Guo, Y. Zhao, G. Yu, and Y. Q. Liu, Adv. Mater. 23, 3128 (2011).
http://dx.doi.org/10.1002/adma.201101178
7.
7. H. S. Seo, Y. S. Jang, Y. Zhang, P. S. Abthagir, and J. H. Choi, Org. Electron. 9, 432 (2008).
http://dx.doi.org/10.1016/j.orgel.2008.01.008
8.
8. A. Virkar, S. Mannsfeld, J. H. Oh, M. F. Toney, Y. H. Tan, G. Y. Liu, J. C. Scott, R. Miller, and Z. Bao, Adv. Funct. Mater. 19, 2294 (2009).
http://dx.doi.org/10.1002/adfm.200801727
9.
9. S. W. Liu, C. C. Lee, H. L. Tai, J. M. Wen, J. H. Lee, and C. T. Chen, ACS Appl. Mater. Interfaces. 2, 2282 (2010).
http://dx.doi.org/10.1021/am1003377
10.
10. S. Ando, R. Murakami, J. Nishida, H. Tada, Y. Inoue, S. Tokito, and Y. Yamashita, J. Am. Chem. Soc. 127, 14996 (2005).
http://dx.doi.org/10.1021/ja055686f
11.
11. Y. Jang, D. H. Kim, Y. D. Park, J. H. Cho, M. Hwang, and K. Cho, Appl. Phys. Lett. 88, 072101 (2006).
http://dx.doi.org/10.1063/1.2173633
12.
12. L. A. Majewski, R. Schroeder, and M. Grell, Adv. Mater. 17, 192 (2005).
http://dx.doi.org/10.1002/adma.200400809
13.
13. W. Xu and S.-W. Rhee, J. Mater. Chem. 19, 5250 (2009).
http://dx.doi.org/10.1039/b905263a
14.
14. M.-H. Yoon, C. Kim, A. Facchetti, and T. J. Mar, J. Am. Chem. Soc. 128, 12851 (2006).
http://dx.doi.org/10.1021/ja063290d
15.
15. H.-W. Zan and C.-W. Chou, Jpn. J. Appl. Phys. 48, 031501 (2009)
http://dx.doi.org/10.1143/JJAP.48.031501
16.
16. Li, Q. Liu, X. Z. Wang, T. Sekitani, T. Someya, and Z. Hu, Sci. China. Tech. Sci. 55, 417 (2012).
http://dx.doi.org/10.1007/s11431-011-4693-5
17.
17. J. H. Kim, S. W. Yun, B. An, Y. D. Han, S. Yoon, J. Joo, and S. Y. Park, Adv. Mater. 25, 719 (2013).
http://dx.doi.org/10.1002/adma.201202789
18.
18. Y. Su, J. Jiang, N. Ke, N. Zhao, W. Xie, J. Xu, J. Mater. Chem. 1, 2585 (2013).
19.
19. R. Abdur, K. Jeong, M. J. Lee, and J. Lee, Org. Electron. 14, 1142 (2013).
http://dx.doi.org/10.1016/j.orgel.2013.02.001
20.
20. W. Gu, W. Jin, B. Wei, J. Zhang, and J. Wang, Appl. Phys. Lett. 97, 243303 (2010)
http://dx.doi.org/10.1063/1.3526737
21.
21. X. J. Yan, J. Wang, H. B. Wang, H. Wang, and D. H. Yan, Appl. Phys. Lett. 89, 053510 (2006).
http://dx.doi.org/10.1063/1.2227714
22.
22. S. Iba, T. Sekitani, Y. Kato, T. Someya, H. Kawaguchi, M. Takamiya, T. Sakurai, and S. Takagi, Appl. Phys. Lett. 87, 023509 (2005).
http://dx.doi.org/10.1063/1.1995958
23.
23. M. McDowell, I. G. Hill, J. E. McDermott, S. L. Nernasek, and J. Schwartz, Appl. Phys. Lett. 88, 073505 (2006).
http://dx.doi.org/10.1063/1.2173711
24.
24. Y. Li, C. Liu, A. Kumatani, P. Darmawan, T. Minari, and K. Tsukagoshi, Org. Electron. 13, 264 (2012).
http://dx.doi.org/10.1016/j.orgel.2011.11.012
25.
25. M. Tello , M. Chiesa, C. M. Duffy, and H. Sirringhaus, Adv. Funct. Mater. 18, 3907 (2008).
http://dx.doi.org/10.1002/adfm.200800009
26.
26. A. B. Chwang and C. D. Frisbie, J. Appl. Phys. 90, 1342 (2001).
http://dx.doi.org/10.1063/1.1376404
27.
27. G. Gu, M. G. Kane, J. E. Doty, and A. H. Firester, Appl. Phys. Lett. 87, 243512 (2005).
http://dx.doi.org/10.1063/1.2146059
28.
28. F. C. Chen, L. J. Kung, T. H. Chen, and Y. S. Lin, Appl. Phys. Lett. 90, 073504 (2007).
http://dx.doi.org/10.1063/1.2535741
http://aip.metastore.ingenta.com/content/aip/journal/adva/4/6/10.1063/1.4884175
Loading
/content/aip/journal/adva/4/6/10.1063/1.4884175
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/adva/4/6/10.1063/1.4884175
2014-06-16
2016-09-29

Abstract

This study investigates the remarkable reduction in the threshold voltage ( ) of pentacene-based thin film transistors with pentacene/copper phthalocyanine (CuPc) sandwich configuration. This reduction is accompanied by increased mobility and lowered sub-threshold slope (). Sandwich devices coated with a 5 nm layer of CuPc layer are compared with conventional top-contact devices, and results indicate that decreased significantly from −20.4 V to −0.2 V, that mobility increased from 0.18 cm2/Vs to 0.51 cm2/Vs, and that was reduced from 4.1 V/dec to 2.9 V/dec. However, the on/off current ratio remains at 105. This enhanced performance could be attributed to the reduction in charge trap density by the incorporated CuPc layer. Results suggest that this method is simple and effectively generates pentacene-based organic thin film transistors with high mobility and low .

Loading

Full text loading...

/deliver/fulltext/aip/journal/adva/4/6/1.4884175.html;jsessionid=UfkTjZRGOEF5Nja1Z7ZTxGcv.x-aip-live-03?itemId=/content/aip/journal/adva/4/6/10.1063/1.4884175&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/adva
true
true

Access Key

  • FFree Content
  • OAOpen Access Content
  • SSubscribed Content
  • TFree Trial Content
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=aipadvances.aip.org/4/6/10.1063/1.4884175&pageURL=http://scitation.aip.org/content/aip/journal/adva/4/6/10.1063/1.4884175'
Right1,Right2,Right3,