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We systematically examined the effects of the substrate temperature ( ) and the oxygen pressure ( ) on the structural and optical properties polycrystalline V O films grown directly on Si(100) substrates by pulsed-laser deposition. A rutile-type V O phase was formed at a ≥ 450 °C at values ranging from 5 to 20 mTorr, whereas other structures of vanadium oxides were stabilized at lower temperatures or higher oxygen pressures. The surface roughness of the V O films significantly increased at growth temperatures of 550 °C or more due to agglomeration of V O on the surface of the silicon substrate. An apparent change in the refractive index across the metal–insulator transition (MIT) temperature was observed in V O films grown at a of 450 °C or more. The difference in the refractive index at a wavelength of 1550 nm above and below the MIT temperature was influenced by both the and , and was maximal for a V O film grown at 450 °C under 20 mTorr. Based on the results, we derived the versus 1/ phase diagram for the films of vanadium oxides, which will provide a guide to optimizing the conditions for growth of V O films on silicon platforms.


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