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1.R. S. Beach, N. Smith, C. L. Platt, F. Jeffers, and A. E. Berkowitz, Appl. Phys. Lett. 68, 2753 (1996).
2.J. Wallmark, Proceedings of the IRE 45, 474 (1957).
3.G. Lucovsky, Journal of Applied Physics 31, 1088 (1960).
4.D. W. Boeringer and R. Tsu, Applied Physics Letters 65, 2332 (1994).
5.K. Zhao, K.-j. Jin, H. Lu, Y. Huang, Q. Zhou, M. He, Z. Chen, Y. Zhou, and G. Yang, Applied Physics Letters 88, 141914 (2006).
6.H. Niu, C. Aoki, T. Matsuda, M. Takai, and M. Maeda, Japanese Journal of Applied Physics 26, L35 (1987).
7.C. Yu and H. Wang, Sensors 10, 10155 (2010).
8.W. Jin, S. Zhang, H. Ni, W. Xiang, J. Xi, X. Feng, and K. Zhao, International Journal of Photoenergy 70, 1 (2013).
9.S. Q. Xiao, H. Wang, Z. C. Zhao, Y. Z. Gu, Y. X. Xia, and Z. H. Wang, Journal of Physics D: Applied Physics 40, 6926 (2007).
10.L. Kong, H. Wang, S. Xiao, J. Lu, Y. Xia, G. Hu, N. Dai, and Z. Wang, Journal of Physics D: Applied Physics 41, 052003 (2008).
11.C. Q. Yu and H. Wang, Applied Physics Letters 96, 171102 (2010).
12.J. P. Cascales, I. Martínez, D. Díaz, J. A. Rodrigo, and F. G. Aliev, Applied Physics Letters 104, 231118 (2014).
13.S. Brems, K. Temst, and C. Van Haesendonck, Phys. Rev. Lett. 99, 067201 (2007).
14.D. Herranz, R. Guerrero, R. Villar, F. G. Aliev, A. C. Swaving, R. A. Duine, C. van Haesendonck, and I. Vavra, Phys. Rev. B 79, 134423 (2009).
15.H. Niu, M. Maeda, Y. Matsubara, H. Yoshida, T. Matsuda, and S. Kishino, Japanese Journal of Applied Physics 28, 2206 (1989).
16.See supplementary material at for AMR and A-LPE with perpendicular fields, additional gold coating, and further simulation details.[Supplementary Material]
17.S. Wang, W. Wang, L. Zou, X. Zhang, J. Cai, Z. Sun, B. Shen, and J. Sun, Advanced Materials 26, 8059 (2014).

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We investigate the influence of an external magnetic field on the magnitude and dephasing of the transient lateral photovoltaic effect (T-LPE) in lithographically patterned Co lines of widths of a few microns grown over naturally passivated p-type Si(100). The T-LPE peak-to-peak magnitude and dephasing, measured by lock-in or through the characteristic time of laser OFF exponential relaxation, exhibit a notable influence of the magnetization direction of the ferromagnetic overlayer. We show experimentally and by numerical simulations that the T-LPE magnitude is determined by the Co anisotropic magnetoresistance. On the other hand, the magnetic field dependence of the dephasing could be described by the influence of the Lorentz force acting perpendiculary to both the Co magnetization and the photocarrier drift directions. Our findings could stimulate the development of fast position sensitive detectors with magnetically tuned magnitude and phase responses.


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