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Structural evolution of Ge-rich Si1−x
films deposited by jet-ICPCVD
8.D. L. Harame, J. H. Comfort, J. D. Cressler, E. F. Crabbe, J. Y. C. Sun, B. S. Meyerson, and T. Tice, Ieee T Electron Dev 42, 455 (1995).
16.A. Kolobov, H. Oyanagi, N. Usami, S. Tokumitsu, T. Hattori, S. Yamasaki, K. Tanaka, S. Ohtake, and Y. Shiraki, Applied Physics Letters 80, 488 (2002).
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Amorphous Ge-rich Si1−x
films with local Ge-clustering were deposited by dual-source jet-type inductively coupled plasma chemical-vapor deposition (jet-ICPCVD). The structural evolution of the deposited films annealed at various temperatures (Ta) is investigated. Experimental results indicate that the crystallization occurs to form Ge and Si clusters as Ta = 500 °C. With raising Ta up to 900 °C, Ge clusters percolate together and Si diffuses and redistributes to form a Ge/SiGe core/shell structure, and some Ge atoms partially diffuse to the surface as a result of segregation. The present work will be helpful in understanding the structural evolution process of a hybrid SiGe films and beneficial for further optimizing the microstructure and properties.
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