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1.
1.International Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 2010), see http://www.itrs.net for updates.
2.
2.K. Kinoshita, T. Tamura, M. Aoki, Y. Sugiyama, and H. Tanaka, Appl. Phys. Lett. 89, 103509 (2006).
http://dx.doi.org/10.1063/1.2339032
3.
3.S. H. Baek, H. W. Jang, C. M. Folkman, Y. L. Li, B. Winchester, J. X. Zhang, Q. He, Y. H. Chu, C. T. Nelson, M. S. Rzchowski et al., Nat. Mater 9, 309 (2010).
http://dx.doi.org/10.1038/nmat2703
4.
4.D. S. Jeong, R. Thomas, R. S. Katiyar, J. F. Scott, H. Kohlstedt, A. Petraru, and C. S. Hwang, Rep. Prog. Phys. 75, 076502 (2012).
http://dx.doi.org/10.1088/0034-4885/75/7/076502
5.
5.R. Chen, M. Lao, J. Xu, and C. Xu, Appl. Phys. Express. 7, 095801 (2014).
http://dx.doi.org/10.7567/APEX.7.095801
6.
6.S. T. Zhang, M. H. Lu, D. Wu, Y. F. Chen, and N. B. Ming, Appl, Phys. Lett. 87, 262907 (2005).
http://dx.doi.org/10.1063/1.2147719
7.
7.R.K. Katiyar, P. Misra, G.L. Sharma, G. Morell, J.F. Scott, and R.S. Katiyar, Mater. Res. Soc. Symp. Proc. 1577 (2013) http://dx.doi.org/10.1557/opl.2013.702.
http://dx.doi.org/10.1557/opl.2013.702
8.
8.Yogesh Sharma, Pankaj Misra, Shojan P. Pavunny, and Ram S Katiyar, Appl. Phys. Lett. 104, 073501 (2014).
http://dx.doi.org/10.1063/1.4865802
9.
9.A. Bhatnagar, A. R. Chaudhuri, Y. H. Kim, D. Hesse, and M. Alexe, Nat. Comm. 4, 2835 (2013).
http://dx.doi.org/10.1038/ncomms3835
10.
10.Y. Yao, W. Liu, Y. Chan, C. Leung, C. Mak, and B. Ploss, Int. J. Appl. Ceram. Technol. 8, 1246 (2011).
http://dx.doi.org/10.1111/j.1744-7402.2010.02577.x
11.
11.L. Pintilie, C. Dragoi, Y. H. Chu, L. W. Martin, R. Ramesh, and M. Alex, Appl. Phys.Lett. 94, 232902 (2009).
http://dx.doi.org/10.1063/1.3152784
12.
12.K. Yin, M. Li, Y. Liu, C. He, F. Zhuge, B. Chen, W. Lu, X. Pan, and R. W. Li, Appl. Phys. Lett. 97, 042101 (2010).
http://dx.doi.org/10.1063/1.3467838
13.
13.C. Wang, K. Jin, Z. Xu, L. Wang, C. Ge, H. Lu, H. Guo, M. He and G. Yang, Appl. Phys. Lett. 98, 192901 (2011).
http://dx.doi.org/10.1063/1.3589814
14.
14.T. L. Qu, Y. G. Zhao, D. Xie, J. P. Shi, Q. P. Chen, and T. L. Ren, Appl. Phys. Lett. 98, 173507 (2011).
http://dx.doi.org/10.1063/1.3584031
15.
15.Y. Sharma, P. Misra, R. K. Katiyar, and R. S Katinar, J. Phys. D, Appl. Phys. 47, 425303 (2014).
http://dx.doi.org/10.1088/0022-3727/47/42/425303
16.
16.S. Y. Yang, J. Seidel, S. J. Byrnes, P. Shafer, C.-H. Yang, M. D. Rossell, P. Yu, Y.-H. Chu, J. F. Scott, J. W. Ager III et al., Nanotechnology 5, 143 (2010).
17.
17.R. K. Katiyar, P. Misra, F. Mendoza, G. Morell, and Ram S. Katina, Appl. Phys. Lett. 105, 142902 (2014).
http://dx.doi.org/10.1063/1.4897627
18.
18.V. S. Puli, D. K. Pradhan, R. K. Katiyar, I. Coondoo, N. Panwar, P. Misra, D.B. Chrisey, J F Scott, and R. S. Katiyar, J. Phys. D: Appl. Phys. 47, 075502 (2014).
http://dx.doi.org/10.1088/0022-3727/47/7/075502
19.
19.N. M. Murari, R. Thomas, R. E. Melgarejo, S. P. Pavunny, and R. S. Katiyar, J. Appl. Phys. 106, 014103 (2009).
http://dx.doi.org/10.1063/1.3158556
20.
20.D. Lee, S. H. Baek, T. H. Kim, J.G. Yoon, C. M. Folkman, C. B. Eom, and T. W. Noh, Phys. Rev. B. 84, 125305 (2011).
http://dx.doi.org/10.1103/PhysRevB.84.125305
21.
21.K Fujiwara, T. Nemoto, M. J. Rozenberg, Y. Nakamura, and H. Takagi, Jpn. J. Appl. Phys. 47, 6266 (2008).
http://dx.doi.org/10.1143/JJAP.47.6266
22.
22.K. Fujiwara, T. Nemoto, M. J. Rozenberg, Y. Nakamura, and H. Takagi, Jpn. J. Appl. Phys. 47, 6266 (2008).
http://dx.doi.org/10.1143/JJAP.47.6266
23.
23.Y. Sharma, S. Pavunny, E. Fachini, J. F. Scott, and R. S. Katiyar, J. Appl. Phys. (2015) (Under review).
24.
24.Y. P. Wang, L. Zhou, M. F. Zhang, X. Y. Chen, J. M. Liu, and Z. G. Liu, Appl. Phys. Lett. 84, 1731 (2004).
http://dx.doi.org/10.1063/1.1667612
25.
25.Yogesh Sharma, Pankaj Misra, and Ram S. Katiyar, J. Appl. Phys. 116, 084505 (2014).
http://dx.doi.org/10.1063/1.4893661
26.
26.D-Y. Lee and T-Y. Tseng, J. Appl. Phys. 110, 114117 (2011).
http://dx.doi.org/10.1063/1.3665871
27.
27.Z. Hu, Q. Li, M. Li, Q. Wang, Y. Zhu, X. Liu, X. Zhao, Yun Liu, and S. Dong, Appl. Phys. Lett. 102, 102901 (2013).
http://dx.doi.org/10.1063/1.4795145
28.
28. Kim et al., ACS Appl. Mater. Interfaces 6, 63466350 (2014).
http://dx.doi.org/10.1021/am501630k
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/content/aip/journal/adva/5/3/10.1063/1.4914475
2015-03-06
2016-12-08

Abstract

We report unipolar resistive switching suitable for nonvolatile memory applications in polycrystalline BiFeO thin films in planar electrode configuration with non-overlapping Set and Reset voltages, On/Off resistance ratio of ∼104 and good data retention (verified for up to 3,000 s). We have also observed photovoltaic response in both high and low resistance states, where the photocurrent density was about three orders of magnitude higher in the low resistance state as compared to the high resistance state at an illumination power density of ∼100 mW/cm2. Resistive switching mechanisms in both resistance states of the planar device can be explained by using the conduction filament (thermo-chemical) model.

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/deliver/fulltext/aip/journal/adva/5/3/1.4914475.html;jsessionid=r2zbKK-Dc0OeN2BvfqS78Fln.x-aip-live-02?itemId=/content/aip/journal/adva/5/3/10.1063/1.4914475&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/adva
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=aipadvances.aip.org/5/3/10.1063/1.4914475&pageURL=http://scitation.aip.org/content/aip/journal/adva/5/3/10.1063/1.4914475'
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