Skip to main content
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
1.K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature 432, 488 (2004).
2.H. Yabuta, M. Sano, K. Abe, T. Aiba, T. Den, H. Kumomi, K. Nomura, T. Kamiya, and H. Hosono, Appl. Phys. Lett. 89, 112123 (2006).
3.D. H. Kim, N. G. Cho, H.-G. Kim, H.-S. Kim, J.-M. Hong, and I.-D. Kim, Appl. Phys. Lett. 93, 032901 (2008).
4.P. Barquinha, L. Pereira, G. Gonçalves, R. Martins, and E. Fortunato, J. Electrochem. Soc. 156, H161 (2009).
5.A. Takagi, K. Nomura, H. Ohta, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Thin Solid Films 486, 38 (2005).
6.A. Suresh, P. Wellenius, A. Dhawan, and J. Muth, Appl. Phys. Lett. 90, 123512 (2007).
7.J. H. Lim, J. H. Shim, J. H. Choi, J. Joo, K. Park, H. Jeon, M. R. Moon, D. Jung, H. Kim, and H.-J. Lee, Appl. Phys. Lett. 95, 012108 (2009).
8.G. H. Kim, H. S. Kim, H. S. Shin, B. D. Ahn, K. H. Kim, and H. J. Kim, Thin Solid Films 517, 4007 (2009).
9.N. Fukuda, S. Ogura, K. Nomura, and H. Ushijima, MRS Proc. 1547, 123 (2013).
10.H. J. Cheong, N. Fukuda, S. Ogura, H. Sakai, Y. Manabu, T. Kodzasa, H. Tokuhisa, K. Tokoro, K. Takeuchi, R. Nagahata, T. Nakamura, and S. Uemura, J. Photopolym. Sci. Technol. 27, 339 (2014).
11.M.-K. Ryu, K.-B. Park, J.-B. Seon, and S.-Y. Lee, J. Soc. Inf. Disp. 18, 734 (2010).
12.H. J. Cheong, N. Fukuda, H. Sakai, S. Ogura, K. Takeuchi, R. Nagahata, and S. Uemura, Jpn. J. Appl. Phys. 53, 05HA12 (2014).
13.Y. J. Chen, M. S. Cao, T. H. Wang, and Q. Wan, Appl. Phys. Lett. 84, 3367 (2004).
14.R. F. Zhuo, L. Qiao, H. T. Feng, J. T. Chen, D. Yan, Z. G. Wu, and P. X. Yan, J. Appl. Phys. 104, 094101 (2008).
15.B.-Y. Su, S.-Y. Chu, Y.-D. Juang, and H.-C. Chen, Appl. Phys. Lett. 102, 192101 (2013).
16.P. K. Nayak, M. N. Hedhili, D. Cha, and H. N. Alshareef, Appl. Phys. Lett. 100, 202106 (2012).
17.G. A. Tompsett, W. C. Conner, and K. S. Yngvesson, ChemPhysChem 7, 296 (2006).
18.E. Strein and D. Allred, Thin Solid Films 517, 1011 (2008).
19.B. Y. Su, S. Y. Chu, Y. D. Juang, and H. C. Chen, Appl. Phys. Lett. 102, 192101 (2013).
20.H. Pu, Q. Zhou, L. Uue, and Q. Zhang, Semicond. Sci. Technol. 28, 105002 (2013).
21.Y. S. Rim, H. S. Kim, and H. J. Kim, ACS Appl. Mater. Interfaces 5, 3565 (2013).
22.G.-W. Chang, T.-C. Chang, Y.-E. Syu, T.-M. Tsai, K.-C. Chang, C.-H. Tu, F.-Y. Jian, Y.-C. Hung, and Y.-H. Tai, Thin Solid Films 520, 1608 (2011).
23.K. Umeda, T. Miyasako, A. Sugiyama, A. Tanaka, M. Suzuki, E. Tokumitsu, and T. Shimoda, J. Appl. Phys. 113, 184509 (2013).
24.M. P. Hung, D. Wang, T. Toda, J. Jiang, and M. Furuta, ECS Solid State Sci. Technol. 3, Q3023 (2014).
25.K. H. Lee, J. H. Park, Y. B. Yoo, W. S. Jang, J. Y. Oh, S. S. Chae, K. J. Moon, J. M. Myoung, and H. K. Baik, ACS Appl. Mater. Interfaces 5, 2585 (2013).
26.P. F. Carcia, R. S. McLean, M. H. Reilly, and G. Nunes, Jr., Appl. Phys. Lett. 82, 1117 (2003).

Data & Media loading...


Article metrics loading...



We fabricated solution-processed indium–gallium–zinc oxide (IGZO) thin-film transistors (TFTs) by microwave (MW) annealing an IGZO precursor film followed by irradiating with vacuum ultraviolet (VUV) light. MW annealing allows more rapid heating of the precursor film than conventional annealing processes using a hot plate or electric oven and promotes the crystallization of IGZO. VUV irradiation was used to reduce the duration and temperature of the post-annealing step. Consequently, the IGZO TFTs fabricated through MW annealing for 5 min and VUV irradiation for 1 min exhibited an on/off current ratio of 108 and a field-effect mobility of 0.3 cm2 V−1 s−1. These results indicate that MW annealing and photoirradiation is an effective combination for annealing solution processed IGZO precursor films to prepare the semiconductor layers of TFTs.


Full text loading...


Access Key

  • FFree Content
  • OAOpen Access Content
  • SSubscribed Content
  • TFree Trial Content
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd