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Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography
6.G. T. Ayenew, A. Fischer, C.-H. Chan, C.-C. Chen, M. Chakaroun, J. Solard, L.-H. Peng, and A. Boudrioua, Optics express 22(106), A1619-A1633 (2014).
7.M. Tchernycheva, P. Lavenus, H. Zhang, A. V. Babichev, G. Jacopin, M. Shahmohammadi, F. H. Julien, R. Ciechonski, G. Vescovi, and O. Kryliouk, Nano letters 14(5), 2456-2465 (2014).
15.M. Aktary, M. O. Jensen, K. L. Westra, M. J. Brett, and M. R. Freeman, Journal of Vacuum Science & Technology B 21(4), L5-L7 (2003).
19.H. Kudo, D. Watanabe, T. Nishikubo, K. Maruyama, D. Shimizu, T. Kai, T. Shimokawa, and C. K. Ober, J. Mater. Chem. 18(30), 3588-3592 (2008).
31.S. Takei, A. Oshima, T. Ichikawa, A. Sekiguchi, M. Kashiwakura, T. Kozawa, S. Tagawa, T. G. Oyama, S. Ito, and H. Miyasaka, Microelectronic Engineering 122, 70-76 (2014).
35.D. M. Tanenbaum, C. Lo, M. Isaacson, H. Craighead, M. Rooks, K. Lee, W. Huang, and T. Chang, Journal of Vacuum Science & Technology B 14(6), 3829-3833 (1996).
36.H. Namatsu, M. Nagase, T. Yamaguchi, K. Yamazaki, and K. Kurihara, Journal of Vacuum Science & Technology B 16(6), 3315-3321 (1998).
37.K. Tanaka, J. Nakamura, Y. Yamada, S. Kobayashi, and T. Itani, presented at the SPIE Advanced Lithography (2009), (unpublished).
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An electron beam (EB) lithography method using inedible cellulose-based resist
material derived from woody biomass has been successfully developed. This method allows the use of pure water in the development process instead of the conventionally used tetramethylammonium hydroxide and anisole. The inedible cellulose-based biomass resist
material, as an alternative to alpha-linked disaccharides in sugar derivatives that compete with food supplies, was developed by replacing the hydroxyl groups in the beta-linked disaccharides with EB-sensitive 2-methacryloyloxyethyl groups. A 75 nm line and space pattern at an exposure dose of 19 μC/cm2, a resist thickness uniformity of less than 0.4 nm on a 200 mm wafer, and low film thickness shrinkage under EB irradiation were achieved with this inedible cellulose-based biomass resist
material using a water-based development process.
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