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/content/aip/journal/adva/5/8/10.1063/1.4928576
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/content/aip/journal/adva/5/8/10.1063/1.4928576
2015-08-10
2016-12-07

Abstract

Using scanning electron microscopy (SEM) and high-resolution x-ray photoelectron spectroscopy with the synchrotron radiation we investigated Si-based micro-clusters embedded in TaSiN thin films having oxygen contamination. TaSiN thin films were deposited by co-sputtering on fixed or rotated substrates and with various power conditions of TaN and Si targets. Three types of embedded micro-clusters with the chemical states of pure Si, SiO-capped Si, and SiO-capped Si were observed and analyzed using SEM and Si 2 and Ta 4 core-level spectra were derived. Their different resistivities are presumably due to the different chemical states and densities of Si-based micro-clusters.

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/deliver/fulltext/aip/journal/adva/5/8/1.4928576.html;jsessionid=ARhO-cQk65E5tMhfRzryFJn9.x-aip-live-02?itemId=/content/aip/journal/adva/5/8/10.1063/1.4928576&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/adva
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=aipadvances.aip.org/5/8/10.1063/1.4928576&pageURL=http://scitation.aip.org/content/aip/journal/adva/5/8/10.1063/1.4928576'
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