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1.A. Tzalenchuk, S. Lara-Avila, A. Kalaboukhov, S. Paolillo, M. Syväjärvi, R. Yakimova, O. Kazakova, T.J.B.M. Janssen, V. Fal’ko, and S. Kubatkin, Nat. Nanotechnol. 5, 186 (2010).
2.T.J.B.M. Janssen, J.M. Williams, N.E. Fletcher, R. Goebel, A. Tzalenchuk, R. Yakimova, S. Lara-Avila, S. Kubatkin, and V.I. Fal’ko, Metrologia 49, 294 (2013).
3.K. v. Klitzing, G. Dorda, and M. Pepper, Phys. Rev. Lett. 45, 494 (1980).
4.B.N. Taylor, IEEE Trans. Instrum. Meas. 39, 2 (1990).
5.A.J.M. Giesbers, G. Rietveld, E. Houtzager, U. Zeitler, R. Yang, K.S. Novoselov, A.K. Geim, and J.C. Maan, Appl. Phys. Lett. 93 (2008).
6.K.S. Novoselov, Z. Jiang, Y. Zhang, S. V Morozov, H.L. Stormer, U. Zeitler, J.C. Maan, G.S. Boebinger, P. Kim, and A.K. Geim, Science 315(80), 1379 (2007).
7.J.A. Alexander-Webber, A.M.R. Baker, T.J.B.M. Janssen, A. Tzalenchuk, S. Lara-Avila, S. Kubatkin, R. Yakimova, B.A. Piot, D.K. Maude, and R.J. Nicholas, Phys. Rev. Lett. 111, 96601 (2013).
8.A. Satrapinski, S. Novikov, and N. Lebedeva, Appl. Phys. Lett. 103, 173509 (2013).
9.I.I. Kaya, G. Nachtwei, K. von Klitzing, and K. Eberl, Europhys. Lett. 46, 62 (1999).
10.F. Delahaye and B. Jeckelmann, Metrologia 40, 217 (2003).
11.B. Jeckelmann, B. Jeanneret, and D. Inglis, Phys. Rev. B 55, 13124 (1997).
12.A. Tzalenchuk, S. Lara-Avila, A. Kalaboukhov, S. Paolillo, M. Syväjärvi, R. Yakimova, O. Kazakova, T.J.B.M. Janssen, V. Fal’ko, and S. Kubatkin, Nat. Nanotechnol. 5, 186 (2010).
13.F. Dahlem, E. Ahlswede, J. Weis, and K. v. Klitzing, Phys. Rev. B 82, 121305 (2010).
14.U. Klass, W. Dietsche, K. Von Klitzing, and K. Ploog, Zeitschrift Für Phys. B Condens. Matter 82, 351 (1991).
15.F. Xia, V. Perebeinos, Y. Lin, Y. Wu, and P. Avouris, Nat. Nanotechnol. 6, 179 (2011).
16.B.C. Huang, M. Zhang, Y. Wang, and J. Woo, Appl. Phys. Lett. 99, 032107 (2011).
17.V.K. Nagareddy, I.P. Nikitina, D.K. Gaskill, J.L. Tedesco, R.L. Myers-Ward, C.R. Eddy, J.P. Goss, N.G. Wright, and A.B. Horsfall, Appl. Phys. Lett. 99, 073506 (2011).
18.A. Venugopal, L. Colombo, and E.M. Vogel, Appl. Phys. Lett. 96, 013512 (2010).
19.K. Nagashio, T. Nishimura, K. Kita, and a. Toriumi, Appl. Phys. Lett. 97, 143514 (2010).
20.J. Robinson, M. LaBella, M. Zhu, M. Hollander, R. Kasarda, Z. Hughes, K. Trumbull, R. Cavalero, and D. Snyder, Appl. Phys. Lett. 98, 053103 (2011).
21.S. Russo, M.F. Craciun, M. Yamamoto, a. F. Morpurgo, and S. Tarucha, Phys. E Low-Dimensional Syst. Nanostructures 42, 677 (2010).
22.R. Yakimova, T. Iakimov, and M. Syväjärvi, PCT/SE2011/050328 (2011).
23.C. Virojanadara, M. Syväjarvi, R. Yakimova, L. Johansson, A.A. Zakharov, and T. Balasubramanian, Phys. Rev. B 78, 1 (2008).
24.S. Lara-Avila, K. Moth-Poulsen, R. Yakimova, T. Bjørnholm, V. Fal’ko, A. Tzalenchuk, and S. Kubatkin, Adv. Mater. 23, 878 (2011).
25.A. Tzalenchuk, S. Lara-Avila, K. Cedergren, M. Syväjärvi, R. Yakimova, O. Kazakova, T.J.B.M. Janssen, K. Moth-Poulsen, T. Bjørnholm, S. Kopylov, V. Fal’ko, and S. Kubatkin, Solid State Commun. 151, 1094 (2011).
26.T. Yager, M.J. Webb, H. Grennberg, R. Yakimova, S. Lara-Avila, and S. Kubatkin, Appl. Phys. Lett. 106 (2015).
27.S. Lara-Avila, Magnetotransport Characterization of Epitaxial Graphene on SiC (Department of Microtechnology and Nanoscience, Quantum Device Physics, Chalmers University of Technology, 2012).
28.See supplementary material at for Details of Sample Fabrication and Geometry and Ti Thickness Dependence of the Contact Resistance.[Supplementary Material]
29.T. Yager, A. Lartsev, R. Yakimova, S. Lara-Avila, and S. Kubatkin, Carbon 87, 409 (2015).
30.E. McCann, Phys. Rev. B 74, 161403 (2006).
31.T. Ohta, A. Bostwick, T. Seyller, K. Horn, and E. Rotenberg, Science 313, 951 (2006).
32.C. Coletti, C. Riedl, D.S. Lee, B. Krauss, L. Patthey, K. von Klitzing, J.H. Smet, and U. Starke, Phys. Rev. B 81, 235401 (2010).
33.L.O. Nyakiti, R.L. Myers-Ward, V.D. Wheeler, E.A. Imhoff, F.J. Bezares, H. Chun, J.D. Caldwell, A.L. Friedman, B.R. Matis, J.W. Baldwin, P.M. Campbell, J.C. Culbertson, C.R. Eddy, G.G. Jernigan, and D.K. Gaskill, Nano Lett. 12, 1749 (2012).
34.T. Yager, A. Lartsev, S. Mahashabde, S. Charpentier, D. Davidovikj, A. V Danilov, R. Yakimova, V. Panchal, O. Kazakova, A. Tzalenchuk, S. Lara-Avila, and S. Kubatkin, Nano Lett. 13, 4217 (2013).
35.C. Chua, M. Connolly, A. Lartsev, T. Yager, S. Lara-Avila, S. Kubatkin, S. Kopylov, V. Fal’Ko, R. Yakimova, R. Pearce, T.J.B.M. Janssen, A. Tzalenchuk, and C.G. Smith, Nano Lett. 14, 3369 (2014).
36.T. Burnett, R. Yakimova, and O. Kazakova, Nano Lett. 11, 2324 (2011).
37.T. Burnett, R. Yakimova, and O. Kazakova, J. Appl. Phys. 112, 54307 (2012).
38.V. Panchal, R. Pearce, R. Yakimova, A. Tzalenchuk, and O. Kazakova, Sci. Rep. 3, 2597 (2013).
39.N. Lindvall, A. Kalabukhov, and A. Yurgens, J. Appl. Phys. 111 (2012).

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We investigate Ti/Au contacts to monolayer epitaxial graphene on SiC (0001) for applications in quantum resistance metrology. Using three-terminal measurements in the quantum Hall regime we observed variations in contact resistances ranging from a minimal value of 0.6 Ω up to 11 kΩ. We identify a major source of high-resistance contacts to be due bilayer graphene interruptions to the quantum Hall current, whilst discarding the effects of interface cleanliness and contact geometry for our fabricated devices. Moreover, we experimentally demonstrate methods to improve the reproducibility of low resistance contacts (<10 Ω) suitable for high precision quantum resistance metrology.


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