Skip to main content

News about Scitation

In December 2016 Scitation will launch with a new design, enhanced navigation and a much improved user experience.

To ensure a smooth transition, from today, we are temporarily stopping new account registration and single article purchases. If you already have an account you can continue to use the site as normal.

For help or more information please visit our FAQs.

banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
/content/aip/journal/adva/6/3/10.1063/1.4944489
1.
1.E. Abbé, Arch. Mikrosk. Anat. Entwichlungsmech 9(1), 413418 (1873).
http://dx.doi.org/10.1007/BF02956173
2.
2.O. Wood et al., Proc. SPIE 7271, 727104 (2009).
http://dx.doi.org/10.1117/12.814379
3.
3.B. Haran et al., Electron Devices Meeting (IEDM), 2008 IEEE International, 1-4 (2008).
4.
4.S. Natarajan et al., Electron Devices Meeting (IEDM), 2014 IEEE International, 3.7.1-3.7.3 (2014).
5.
5.P. Zimmerman, SPIE Newsroom, 10.1117/2.1200906.1691,1-3 (2009).
http://dx.doi.org/10.1117/2.1200906.1691
6.
6.S. W. Hell and J. Wichmann, Opt. Lett. 19(11), 780782 (1994).
http://dx.doi.org/10.1364/OL.19.000780
7.
7.E. Betzig, J. K. Trautman, T. D. Harris, J. S. Weiner, and R. L. Kostelak, Science 251(5000), 14681470 (1991).
http://dx.doi.org/10.1126/science.251.5000.1468
8.
8.M. Rust, M. Bates, and X. Zhuang, Nature Methods 3(10), 793796 (2003).
http://dx.doi.org/10.1038/nmeth929
9.
9.R. Menon and H. I. Smith, J. Opt. Soc. Am. A 23(9), 2290-2294 (2006).
http://dx.doi.org/10.1364/JOSAA.23.002290
10.
10.R. Menon, Hsin-Yu Tsai, and S. W. Thomas III, Phys. Rev. Lett. 98(4), 043905-1-4 (2007).
http://dx.doi.org/10.1103/PhysRevLett.98.043905
11.
11.T. L. Andrew, H.-Y. Tsai, and R. Menon, Science 324, 917-921 (2009).
http://dx.doi.org/10.1126/science.1167704
12.
12.F. Masid, T. L. Andrew, and R. Menon, Opt. Exp. 21(4), 5209-5214 (2013).
http://dx.doi.org/10.1364/OE.21.005209
13.
13.A. Majumder, F. Masid, B. J. Pollock, T. L. Andrew, and R. Menon, Opt. Exp. 23(9), 12244-12250 (2015).
http://dx.doi.org/10.1364/OE.23.012244
14.
14.G. Pariani, R. Castagna, R. Menon, C. Bertarelli, and A. Bianco, Opt. Lett. 38(16), 3024-3027 (2013).
http://dx.doi.org/10.1364/OL.38.003024
15.
15.J. E. Foulkes and R. J. Blaikie, J. Vac. Sci. Tech. B 27, 2941-2946 (2009).
http://dx.doi.org/10.1116/1.3237098
16.
16.See supplementary material at http://dx.doi.org/10.1063/1.4944489 for detailed analyses of photochromic behavior.[Supplementary Material]
17.
17.M. Warner and R. J. Blaikie, Phys. Rev. A 80(3), 03833 (2009).
http://dx.doi.org/10.1103/PhysRevA.80.033833
18.
18.P. Cantu, T. L. Andrew, and R. Menon, App. Phys. Lett. 105, 193105 (2014).
http://dx.doi.org/10.1063/1.4902024
http://aip.metastore.ingenta.com/content/aip/journal/adva/6/3/10.1063/1.4944489
Loading
/content/aip/journal/adva/6/3/10.1063/1.4944489
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/adva/6/3/10.1063/1.4944489
2016-03-14
2016-12-05

Abstract

Optical lithography is the most prevalent method of fabricating micro-and nano-scale structures in the semiconductor industry due to the fact that patterning using photons is fast, accurate and provides high throughput. However, the resolution of this technique is inherently limited by the physical phenomenon of diffraction. Absorbance-Modulation-Optical Lithography (AMOL), a recently developed technique has been successfully demonstrated to be able to circumvent this diffraction limit. AMOL employs a dual-wavelength exposure system in conjunction with spectrally selective reversible photo-transitions in thin films of photochromic molecules to achieve patterning of features with sizes beyond the far-field diffraction limit. We have developed a finite-element-method based full-electromagnetic-wave solution model that simulates the photo-chemical processes that occur within the thin film of the photochromic molecules under illumination by the exposure and confining wavelengths in AMOL. This model allows us to understand how the materialcharacteristics influence the confinement to sub-diffraction dimensions, of the transmitted point spread function (PSF) of the exposure wavelength inside the recording medium. The model reported here provides the most comprehensive analysis of the AMOL process to-date, and the results show that the most important factors that govern the process, are the polarization of the two beams, the ratio of the intensities of the two wavelengths, the relative absorption coefficients and the concentration of the photochromic species, the thickness of the photochromic layer and the quantum yields of the photoreactions at the two wavelengths. The aim of this work is to elucidate the requirements of AMOL in successfully circumventing the far-field diffraction limit.

Loading

Full text loading...

/deliver/fulltext/aip/journal/adva/6/3/1.4944489.html;jsessionid=1GNMOhcA7Lg8zJk3jpcjSeXN.x-aip-live-06?itemId=/content/aip/journal/adva/6/3/10.1063/1.4944489&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/adva
true
true

Access Key

  • FFree Content
  • OAOpen Access Content
  • SSubscribed Content
  • TFree Trial Content
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=aipadvances.aip.org/6/3/10.1063/1.4944489&pageURL=http://scitation.aip.org/content/aip/journal/adva/6/3/10.1063/1.4944489'
Right1,Right2,Right3,