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Nano silver-catalyzed chemical etching of polycrystalline silicon wafer for solar cell application
4.H. Y. Chen, G. D. Yuan, Y. Peng, M. Hong, Y. B. Zhang, Z. Q. Liu, J. X. Wang, Bin Cai, Y. M. Zhu, and J. M. Li, Appl. Phys. Lett. 104, 193904 (2014).
10.Y. Wang, Y. P. Liu, T. Lai, H. L. Liang, Z. L. Li, Z. X. Mei, F. M. Zhang, A. Kuznetsov, and X. L. Du, RSC Adv. 3, 15483 (2013).
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Silvernanoparticles were deposited on the surface of polycrystallinesilicon wafer via vacuum thermal evaporation and metal-catalyzed chemical etching (MCCE) was conducted in a HF-H2O2etching system. Treatment of the etchedsilicon wafer with HF transformed the textured structure on the surface from nanorods into nanocones. An etching time of 30 s and treatment with HF resulted in nanocones with uniform size distribution and a reflectivity as low as 1.98% across a spectral range from 300 to 1000 nm.
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