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/content/aip/journal/adva/6/3/10.1063/1.4945398
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/content/aip/journal/adva/6/3/10.1063/1.4945398
2016-03-30
2016-09-27

Abstract

Silvernanoparticles were deposited on the surface of polycrystallinesilicon wafer via vacuum thermal evaporation and metal-catalyzed chemical etching (MCCE) was conducted in a HF-HOetching system. Treatment of the etchedsilicon wafer with HF transformed the textured structure on the surface from nanorods into nanocones. An etching time of 30 s and treatment with HF resulted in nanocones with uniform size distribution and a reflectivity as low as 1.98% across a spectral range from 300 to 1000 nm.

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