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/content/aip/journal/adva/6/5/10.1063/1.4942957
2016-02-23
2016-12-06

Abstract

FeNinanoparticlefilms with the size about 6 nm were deposited by a high energetic cluster deposition source. An electric field of about 0 - 40 kV was applied on the sample platform when the films were prepared. The field assisted deposition technique can dramatically induce in-plane magnetic anisotropy. To probe the microwave absorption properties, the FeNinanoparticles were deliberately deposited on the dielectric Teflon sheet. Then the laminated FeNi/Teflon composites were used to do reflection loss scan. The results prove that the application of electric field is an effective avenue to improve the GHz microwave absorption performance of our magnetic nanoparticlesfilms expressed by the movement of reflection loss peak to high GHz region for the composites.

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/deliver/fulltext/aip/journal/adva/6/5/1.4942957.html;jsessionid=UJxogC6wY_mRs4DEJO3e_a5M.x-aip-live-02?itemId=/content/aip/journal/adva/6/5/10.1063/1.4942957&mimeType=html&fmt=ahah&containerItemId=content/aip/journal/adva
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
/content/realmedia?fmt=ahah&adPositionList=
&advertTargetUrl=//oascentral.aip.org/RealMedia/ads/&sitePageValue=aipadvances.aip.org/6/5/10.1063/1.4942957&pageURL=http://scitation.aip.org/content/aip/journal/adva/6/5/10.1063/1.4942957'
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