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/content/aip/journal/adva/6/6/10.1063/1.4953805
2016-06-07
2016-09-28

Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiN membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiN membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.

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