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Facile preparation of porous alumina through-hole masks for sputtering by two-layer anodization
Z. Zeng, X. Huang, Z. Yin, H. Lin, Y. Chen, H. Li, Q. Zhang, J. Ma, F. Boey, and H. Zhang, Adv. Mater. 24, 4138 (2012).
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Highly ordered porous alumina through-hole masks were fabricated on a substrate by combining two-layer anodization with subsequent through-holing by selective etching. This process allowed the fabrication of porous alumina masks without an increase in pore size during the etching performed for through-holing. Additionally, the process contributed to improved operability in the setting of the masks on substrates because the second anodizing layer acts as a supporting layer for the handling of the mask. The fabrication of ordered Au
nanodot arrays was demonstrated as an example application of the through-hole masks obtained by the present process.
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