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Interfacial stabilization of bilayered nanolaminates by asymmetric block copolymers
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Image of FIG. 1.
FIG. 1.

(Color online) Dewetting rates measured for bilayered PS/PMMA nanolaminates alone (▪) and containing the S10M50 •) and S50M10 (○) copolymers added to the top PS50 (a) or bottom PMMA (b) layers during fabrication. The dashed line identifies dewetting in the absence of copolymer and delineates stabilization from destabilization, and the error bars denote the standard error. The schematic diagrams depict the behavior of S10M50 molecules as they self-assemble into micelles and likewise modify the polymer/polymer interface.

Image of FIG. 2.
FIG. 2.

(Color online) Illustration of the bilayered nanolaminate design with a pure S10M50 diblock copolymer interlayer positioned between the top (PS) and bottom (PMMA) homopolymer layers. In complementary systems, the copolymer is also added to the top PS layer during fabrication.

Image of FIG. 3.
FIG. 3.

Measured dewetting rates (left ordinate) and calculated S-block packing (right ordinate) as functions of copolymer interlayer thickness (cf. Fig. 2) for the S10M50 (a) and S50M10 (b) copolymers. Results are included for systems in which the PS30 top layer is pure (○) or contains 0.25 wt. % copolymer (•). Error bars denote the standard error, and the dashed line in (a) identifies the PS30 dewetting rate with no copolymer. Dotted lines pinpoint the interlayer thickness and PS30 dewetting rate corresponding to the formation of a brush of S blocks along the PS/PMMA interface at Σ = 1.


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Table I.

Values of Φcmc predicted for two SM diblock copolymers in their parent homopolymers.


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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Interfacial stabilization of bilayered nanolaminates by asymmetric block copolymers