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Electrical properties of the amorphous interfacial layer between Al electrodes and epitaxial NiO films
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10.1063/1.4704917
/content/aip/journal/apl/100/17/10.1063/1.4704917
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/17/10.1063/1.4704917
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Figures

Image of FIG. 1.
FIG. 1.

(a) and (b) Conventional and high-resolution TEM images, respectively, of Al/a-IL/epi-NiO(500)/STO substrate of the pristine sample, (c) high-resolution TEM image of Al/a-IL/epi-NiO(500) of the forming sample, and (d) high-resolution TEM image of Al/a-IL/epi-NiO(700) of the pristine sample.

Image of FIG. 2.
FIG. 2.

(a) and (b) EDS line profiles of the pristine and forming samples, respectively. Annular dark field image of Al/a-IL/epi-NiO/SRO is inserted in (a), and shown the EDS line and drift control box.

Image of FIG. 3.
FIG. 3.

(a) Ni L2,3 edge from the NiO films and the lower/upper a-IL after the forming process. Annular dark field image of Al/a-IL/epi-NiO is inserted. (b) Ni L2,3 from the lower/upper a-IL of the pristine sample.

Image of FIG. 4.
FIG. 4.

(a) Ni M and Al L2,3 edges from the upper a-IL of the pristine and forming samples; (b) Ni M and Al L2,3 edges from the lower a-IL of the pristine and forming samples.

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/content/aip/journal/apl/100/17/10.1063/1.4704917
2012-04-23
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical properties of the amorphous interfacial layer between Al electrodes and epitaxial NiO films
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/17/10.1063/1.4704917
10.1063/1.4704917
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