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Laterally confined two-dimensional electron gases in self-patterned LaAlO3/SrTiO3 interfaces
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10.1063/1.4728109
/content/aip/journal/apl/100/23/10.1063/1.4728109
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/23/10.1063/1.4728109
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) RHEED pattern taken along the [100] direction of the STO substrate treated at 1000 °C for 2 h. (b) Intensity of the specular spot during deposition of 6 ML of LAO (note that the intensity of the incident electrons was manually increased at time from 157 to 181 s), and pattern at the end of the deposition (c). (d) AFM topographic and (e) backscattered electrons SEM images of the film. (f) Sketch of the atomic stacking sequences at the interface. (g) Temperature dependence of the resistance with current injected along and across the surface steps, showing isotropic transport.

Image of FIG. 2.
FIG. 2.

AFM topographic (a) and phase (b) images, and RHEED pattern taken along the [100] direction (c) of the STO substrate treated 2 h at 1300 °C (the insets are closer views). (d) Intensity of the specular spot during deposition of 6 ML of LAO, with a zoom of the last oscillations in the inset, and pattern of the film at the end of the deposition (e). (f) Backscattered electrons SEM and (g) AFM phase images of the film.

Image of FIG. 3.
FIG. 3.

(a) Sketch of the atomic stacking sequences at the interface of the LAO film on STO treated at 1300  °C for 2 h. (b) Temperature dependence of the sheet resistance with current injected along () and across () the surface steps (top) and sheet resistance anisotropy (bottom). (c) Temperature dependence of the mobilities and . The inset shows the sheet carrier density.

Image of FIG. 4.
FIG. 4.

AFM topographic (a) and phase (b) images, and RHEED pattern (c) taken along the [100] direction of the STO substrate treated 6 h at 1300 °C. (d) Intensity of the specular spot during growth of 5 ML of LAO, and pattern of the film at the end of the deposition (e). (f) Backscattered electrons SEM and (g) AFM phase images of the film. (h) Sketch of the atomic stacking sequences at the LAO/STO interface.

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/content/aip/journal/apl/100/23/10.1063/1.4728109
2012-06-07
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Laterally confined two-dimensional electron gases in self-patterned LaAlO3/SrTiO3 interfaces
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/23/10.1063/1.4728109
10.1063/1.4728109
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