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Light controlled magnetoresistance and magnetic field controlled photoresistance in CoFe film deposited on BiFeO3
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10.1063/1.4731201
/content/aip/journal/apl/100/26/10.1063/1.4731201
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/26/10.1063/1.4731201
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Schematics of the experiment. Light is illuminated on the BFO crystal along [100] direction. (b) Microscope image of the BFO with CoFe film on the top.

Image of FIG. 2.
FIG. 2.

(a) Time dependence of photo-induced change in resistance of CoFe film deposited on BFO substrate. Inset: (left scale) optical absorption of BiFeO3 reproduced with permission from R. Moubah et al., Appl. Phys. Express 5, 035802 (2012). Copyright © 2012 The Japan Society of Applied Physics; and photoresistance (right scale). (b) Resistance of CoFe film for the first exposure to 365 nm UV light with long time relaxation and subsequent pulses. (c) Time dependence of photoresistance of CoFe film (left scale) and photostrain [101] (right scale) for 365 nm light excitation.

Image of FIG. 3.
FIG. 3.

(a) AMR of the CoFe film at 0.5 T under green (530 nm) and blue (455 nm) illumination and in darkness, respectively. (b) Magnetoresistance loops in darkness and under 530 nm light with magnetic field in perpendicular and in parallel configuration. (c) Photoresistance at different magnetic field values in the perpendicular configuration.

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/content/aip/journal/apl/100/26/10.1063/1.4731201
2012-06-29
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Light controlled magnetoresistance and magnetic field controlled photoresistance in CoFe film deposited on BiFeO3
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/26/10.1063/1.4731201
10.1063/1.4731201
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