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Fabrication and magnetic properties of free-standing Ni nanotube arrays with controllable wall thickness
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10.1063/1.3681136
/content/aip/journal/apl/100/5/10.1063/1.3681136
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/5/10.1063/1.3681136
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) Schematics of the fabrication process of Ni nanotube arrays.

Image of FIG. 2.
FIG. 2.

SEM image of free-standing Ni nanotube arrays.

Image of FIG. 3.
FIG. 3.

TEM images of Ni nanotubes with wall thicknesses of (a) 15 nm, (b) 32 nm, and (c) 47 nm, respectively; (d) the dependence of wall thickness on the pore-widening time.

Image of FIG. 4.
FIG. 4.

(Color online) The x-ray diffraction patterns of Ni nanotubes with different wall thicknesses.

Image of FIG. 5.
FIG. 5.

(Color online) Hysteresis loops for nanotubes with wall thicknesses of (a) 15 nm, (b) 32 nm, and (c) 47 nm. The external field was applied parallel (H//) and perpendicular (H⊥) to the tube axis; simulated hysteresis loops for nanotubes with wall thicknesses of (d) 15 nm, (e) 30 nm, and (f) 45 nm. The demagnetization factors parallel to the tube axis (perpendicular to the plane of the 2D arrays) were set to 0.2, 0.6, and 0.7, respectively.

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/content/aip/journal/apl/100/5/10.1063/1.3681136
2012-01-31
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication and magnetic properties of free-standing Ni nanotube arrays with controllable wall thickness
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/5/10.1063/1.3681136
10.1063/1.3681136
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