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Investigation of proximity effects in electron microscopy and lithography
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10.1063/1.3681593
/content/aip/journal/apl/100/5/10.1063/1.3681593
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/5/10.1063/1.3681593
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Figures

Image of FIG. 1.
FIG. 1.

(Color online) Scheme of the ideal EBISA process: (a) local irradiation of the surface with a focused electron beam; (b) dosage of the precursor and adsorption on the surface, dissociation of molecules at the activated sites; (c) formation of Fe nuclei; (d) autocatalytic decomposition at the initial Fe nuclei; (e) enlarged, autocatalytically grown Fe deposit.

Image of FIG. 2.
FIG. 2.

(Color online) Monte Carlo simulation of BSE exit area with the program Casino V2.42: BSEs emitted from the surface plotted vs. the radius, with 0 being the impact point of the PE beam, for the SiN-bulk and the SiN-200 nm substrate. The BSE hits are sampled in 20 nm increments and correspond to an exit annulus with A = [(n × 20 nm)2 − ((n − 1) × 20 nm)2]π and r = (n − 1) × 20 nm (n ); the hits are not normalized to this annulus.

Image of FIG. 3.
FIG. 3.

(Color online) SEM images of Fe deposits on SiN-200 nm ((a) and (c)) and on SiN-bulk ((b) and (d)) generated via EBISA and successive autocatalytic growth via 6 ((a) and (b)) and 720 nC ((c) and (d)) (point irradiation at IPE = 400 pA and UPE = 15 kV) and an additional gas dosage time of 270 min at a nominal Fe(CO)5 background pressure of 3.0 × 10−7 mbar.

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/content/aip/journal/apl/100/5/10.1063/1.3681593
2012-02-03
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of proximity effects in electron microscopy and lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/100/5/10.1063/1.3681593
10.1063/1.3681593
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