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SEM images of (a) bare-stainless steel mesh (SSM) substrate, (b) ITO-NWs on SSM, and (c) ITO NW. Inserts are high magnitude SEM images. (d) HRTEM image of ITO NW and inserts are TEM image of NW-tip and selective area diffraction (SAD) pattern.
(Color online) (a) Scheme of ITO core-TiO2 shell NW photoanode structure on SSM and practical picture of the bended photoanode; TEM image (b) and a cross-sectional TEM image (c) of ITO core-TiO2 shell NWs; and (d) HRTEM image of TiO2 shell layer and its FFT pattern.
(Color online) (a) Current density vs applied potential (J-V) characteristics of the core-shell photoanodes as a function of ITO NW length, the orange line indicates dark currents of all the specimens. (b) Current density at 0 V vs SCE, transmittance and reflectance at 360 nm of the core-shell photoanodes as a function of ITO NW length.
(Color online) (a) Current density at 0 V vs SCE of the core-shell photoanodes as a function of TiO2 shell thickness. (b) Conduction band (C.B.) and valance band (V.B.) bending scheme within shell layers thin or thicker than SPL thickness. (c) Mott-Schottky plot of 50 nm-thick ALD-TiO2 film at the frequency of 10 kHz.
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