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XRD patterns of (a) θ-2θ scan of LCMO:5% STO film grown on LAO substrate; (b) φ-scans from (202) reflection of LCM:STO film and (202) of LAO substrate.
(Color online) SEM images of LCMO (a), LCMO:5% STO (b), cross-section HRTEM image (c) of LCMO:5% STO films on LAO substrates, the EDS spectra of LCMO:3% STO (d), and LCMO:5% STO (e) on LAO substrates.
(Color online) Temperature (T) dependent resistivity (ρ) of LCMO (a), LCMO:3% STO (b), and LCMO:5% STO (c) films at applied magnetic fields of 0, 0.5, 1, 2, and 3 T. (d)The experimental data (shown as symbols) and the linear fitting results (shown as solid lines) of ln(ρ/T) ∼ 1/T for LCMO, LCMO:3% STO, and LCMO:5% STO films at temperatures higher than T p and zero magnetic field.
(Color online) (a) The temperature dependent MR of LCMO, LCMO:3% STO, and LCMO:5% STO films at 3 T. (b) The temperature dependent MR of the LCMO:5% STO film at 0.5, 2, and 3 T.
The MR effects together with the transition temperature and magnetic fields of some LCMO single phase, doped LCMO, LCMO based superlattice and composites.
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