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Ni80Fe20/Ni binary nanomagnets for logic applications
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10.1063/1.4751259
/content/aip/journal/apl/101/10/10.1063/1.4751259
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/10/10.1063/1.4751259
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Figures

Image of FIG. 1.
FIG. 1.

(a) Schematic of the self-aligned shadow deposition method. (b) and (c) Scanning electron micrographs image of the binary nanostructure array. (d) Experimental M-H loops of the binary for θ = 0°. MFM images of the array for saturated state (along -X direction) (e) and anti-parallel magnetic state (f). (g) The simulated full hysteresis loop of the Ni/Ni80Fe20 with a 5 nm gap (solid line) and without the gap (dashed line) separating the elements. The simulated magnetization states corresponding to positions (I-III) on the hysteresis loop are shown as insets.

Image of FIG. 2.
FIG. 2.

(a) Representative absorption curves of the Ni/Ni80Fe20 nanostructure as a function of Happ for saturated state. (b) Experimental 2D full loop absorption spectra of the binary for θ = 0°. (c) Representative absorption curves of the Ni/Ni80Fe20 nanostructure as a function of Happ for anti-parallel magnetic state. (d) Backward half of the minor loop FMR measurement results.

Image of FIG. 3.
FIG. 3.

(a)-(d) The remanence resonance frequency versus reset field orientation θ as a function of Hre amplitude. (e) The simulated angular dependent remanence magnetization for Hre = −1400 Oe. (f) Simulated |Mx| when Happ is swept from −1500 Oe to 1500 Oe for θ = 90° with Hx = 0 Oe and 50 Oe. The simulated remanence magnetization for θ = 90° with (g) Hx = 0 Oe and (h) 50 Oe.

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/content/aip/journal/apl/101/10/10.1063/1.4751259
2012-09-07
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ni80Fe20/Ni binary nanomagnets for logic applications
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/10/10.1063/1.4751259
10.1063/1.4751259
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