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Growth processes of lithium titanate thin films deposited by using pulsed laser deposition
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10.1063/1.4752466
/content/aip/journal/apl/101/12/10.1063/1.4752466
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/12/10.1063/1.4752466
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

P O2 dependence of (a) the out-of-plane XRD pattern of pristine LTO thin films, and (b) the XRD patterns near the lithium titanate (444) peak: closed circle, MgAl2O4 substrate; closed square, rutile TiO2; open square, Li0.74Ti3O6.

Image of FIG. 2.
FIG. 2.

(a) P O2 dependence of the resistivity. Optical transmittance of the films deposited at P O2 = 1 × 10−3 Torr (b) and 1 × 10−6 Torr (c).

Image of FIG. 3.
FIG. 3.

(a) The reciprocal space mapping of LiTi2O4 (331) and MgAl2O4 (311) peaks. (b) Raman spectroscopy of the films grown at P O2 = 1 × 10−6 and 1 × 10−7 Torr. (c) Temperature dependence of the magnetization ofthe LiTi2O4 film deposited at P O2= 1 × 10−6 Torr.

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/content/aip/journal/apl/101/12/10.1063/1.4752466
2012-09-17
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth processes of lithium titanate thin films deposited by using pulsed laser deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/12/10.1063/1.4752466
10.1063/1.4752466
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