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(a) Process for fabricating Ormocomp Mother stamps. A black silicon master is formed by mask-less reactive ion etching. Selected areas can be removed using conventional photolithography and dry etching. The master is anti-stiction coated and Ormocomp is poured onto the master. A PMMA plate is placed on top, planarizing the Ormocomp film. The Ormocomp is cured with UV light and the Mother stamp is released. (b) The final Ormocomp sample is formed from the Mother stamp similar to steps (a3) and (a4). (c) Using two identical Mother stamps, a sample can be formed with identical nanostructures on each face. (d1) Side view SEM of a black silicon master. (d2) The final Ormocomp sample which was replicated from the Mother stamp.
(a) Side view SEM of BSi. (b) Top view SEM image of BSi. (c) Dark field optical micrographs of BSi. (d) Photographs of fabricated Ormocomp samples. Samples were illuminated by a powerful white light source under normal incidence, and the scattered light was photographed at an oblique angle.
(a1) Intensity of transmitted, scattered light, measured at an angle of , for the six different Ormocomp samples. (a2) and (a3) Surface plots of the full ARS measurements of samples C and A, respectively. (b) Power spectral density of type A Ormocomp sample. The square marked A is the dominating spatial frequency, q, found by fitting, with a 95% confidence interval. Squares marked B-F indicate q for other types of surfaces. (c) Direct transmission measurements of Ormocomp samples with antireflective structures on one face. Inset: Wavelength at intersection between transmission spectra of planar and structured surfaces, , as a function of the dominating structural periods, .
(a) Photograph of Ormocomp sample with antireflective nanostructures on top and bottom face, placed on a sheet of paper with a printed logo. Nanostructures are on the right side of the fully transparent sample. (b) SEM image of the sample, showing the difference between the planar (left) and the nanostructured surface (right).
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