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Improved charge-trapping properties of TiON/HfON dual charge storage layer by tapered band structure
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10.1063/1.4754830
/content/aip/journal/apl/101/13/10.1063/1.4754830
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/13/10.1063/1.4754830
/content/aip/journal/apl/101/13/10.1063/1.4754830
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/content/aip/journal/apl/101/13/10.1063/1.4754830
2012-09-27
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improved charge-trapping properties of TiON/HfON dual charge storage layer by tapered band structure
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/13/10.1063/1.4754830
10.1063/1.4754830
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