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The scheme of PLD equipment and BxC dual-target.
Typical (a) FESEM cross-sectional image and (b) GIXRD pattern of boron carbide thin films.
C1s XPS spectrums of deposited boron carbide thin films from B3C dual-target at rotating speed of (a) 3, (b) 9, and (c) 18 rpm, and (d) B/C atomic ratio of deposited boron carbide thin films from BxC (0.1 < x < 11) dual-targets compare with that of former reports.
C1s XPS spectrums of deposited boron carbide thin films from BxC dual-targets: (a) x = 0.2, (b) x = 3, (c) x = 8, and (d) ratio of sp 2/sp 3 and structure of boron carbide.
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