1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Modified processing techniques of a DNA biopolymer for enhanced performance in photonics applications
Rent:
Rent this article for
USD
10.1063/1.4758484
/content/aip/journal/apl/101/15/10.1063/1.4758484
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/15/10.1063/1.4758484
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

NMR spectra of DNA-CTMA with various rinsing techniques compared to CTMA. The main peaks are labeled directly below each spectrum. These data show no residual CTMA in the SD, 32 cycle rinsed DNA-CTMA.

Image of FIG. 2.
FIG. 2.

DC resistivity measurements as a function of temperature comparing SD and water rinsed DNA-CTMA.

Image of FIG. 3.
FIG. 3.

Dielectric constant K and dissipation factor D as a function of frequency for both SD and water rinsed DNA-CTMA.

Loading

Article metrics loading...

/content/aip/journal/apl/101/15/10.1063/1.4758484
2012-10-09
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modified processing techniques of a DNA biopolymer for enhanced performance in photonics applications
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/15/10.1063/1.4758484
10.1063/1.4758484
SEARCH_EXPAND_ITEM