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(a) Ag NP ink used in this study with (b) a schematic image of micro gravure printing. SEM image of the fabricated (c) NP and (d) evaporated Ag film.
Resistance as a function of stretch for 100 and 380 nm Ag films fabricated by printing and evaporation.
Failure morphology of (a) 100 and (b) 380 nm Ag films. The NP based film shows a highly porous structure when the thickness is increased to 380 nm.
(a) Normalized resistance-cycles curve of NP-based and evaporated films and (b) strain range (Δεt)-fatigue life (Nf) curve. Inset in (a) shows the cross-sectional image of each film after failure. FIB milling was used for cross-section preparation and Pt was deposited prior to milling in order to protect the region of interest.
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