Full text loading...
(a) Illustration of the overall fabrication procedure of the MIM-based plasmonic metamaterial structure. The SSQ pattern was continuously created on the MIM-deposited PET substrate by the R2R NIL process, which is schematically depicted in detail in (b). The flexible large-are PDMS mold having the hole pattern shown in (c) is rolling over a SSQ-coated Al/SiO2/Al/PET substrate under conformal contact, imprinting the SSQ dot pattern with a very thin residual layer as indicated in (d).
(a) The fabricated plasmonic metamaterial film comprising the Al disk array faithfully patterned via the R2R NIL process on SiO2/Al/PET substrates. The scalability and flexibility are exemplified in the inset to (a).The enlarged top view (b) discloses the fabricated disk pattern geometry that is almost identical to the original design described in the upper-right corner. The inset reveals the remaining SSQ mask on top of Al disk patches.
IR reflection spectrum measured from the fabricated sample by the FT-IR spectroscopy (bold pink line) that is compared to the 3D simulation plot calculated from the original design (normal blue line).
Simulation data of fundamental and second-order resonant wavelength values for each diameter.
Article metrics loading...