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Investigation of carbon interstitials with varied SiO2 thickness in HfO2/SiO2/4H-SiC structure
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10.1063/1.4772986
/content/aip/journal/apl/101/25/10.1063/1.4772986
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/25/10.1063/1.4772986
/content/aip/journal/apl/101/25/10.1063/1.4772986
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/content/aip/journal/apl/101/25/10.1063/1.4772986
2012-12-21
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Investigation of carbon interstitials with varied SiO2 thickness in HfO2/SiO2/4H-SiC structure
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/25/10.1063/1.4772986
10.1063/1.4772986
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