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XTEM images of C:Ni NC thin films deposited at ∼60 °C without (a) and with (b) and (c) an assisting Ar+ beam of 100 eV ion energy. Panel (b) (panel (c)) shows the film cross section oriented perpendicular (parallel) to the plane of ion incidence.
Film morphology measured by XTEM ((a)-(c)) and GISAXS ((d)-(f)) of C:Ni films grown with an assisting Ar+ beam of 50 eV ion energy at ∼60 °C (a) and (d), at 300 °C (b) and (e), and at 500 °C (c) and (f). The insets in ((a)-(c)) show the FT’s of the XTEM images. A logarithmic colour scale was used in ((d)-(f)).
XTEM analysis of a C:Ni NC timber frame. The sample was rotated by ∼180° around its surface normal after the first half of the deposition, giving a total deposition time of 2 h. (a) Overview XTEM image (185 k magnification). The arrows indicate exemplarily the areas of the Ni3C and the a-C phase. (b) HTEM image (620 k magnification) highlighting the local epitaxial growth of Ni3C (113) crystal planes across the junction of sequentially deposited film fractions. The insets show the FFTs of the corresponding white squared areas.
Variable angle FTIR spectroscopic ellipsometry of two selected C:Ni films grown at 300 °C: (a) grown without assisting ions, (b) grown using assisting Ar+ ions of 50 eV, for two orthogonal measurement planes, and (c) the effective pseudo-refractive indices (〈n〉 solid lines, 〈k〉 dashed lines) extracted from the applied model.
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