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Metal-induced solid-phase crystallization of amorphous TiO2 thin films
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10.1063/1.4739934
/content/aip/journal/apl/101/5/10.1063/1.4739934
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/5/10.1063/1.4739934
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Figures

Image of FIG. 1.
FIG. 1.

(a) XRD patterns of TiO2 thin films on glass substrates annealed at 250–270 °C, and (b) POM images of TiO2 thin films on glass substrates annealed at 230–270 °C.

Image of FIG. 2.
FIG. 2.

XRD patterns of TiO2 thin films on Au, Cu, Ni, and Ti metal contact layers annealed at 250 °C.

Image of FIG. 3.
FIG. 3.

(a) XRD patterns and (b) POM images of TiO2 thin films on 50-nm-thick Ni contact layers annealed at 200–240 °C. (c) Crystallization fraction of anatase phase of TiO2 thin films annealed at each temperature on glass substrates and Ni contact layers.

Image of FIG. 4.
FIG. 4.

(a) XRD patterns and (b) POM images of TiO2 thin films on patterned Ni contact layers with different Ni thicknesses, annealed at 250 °C.

Image of FIG. 5.
FIG. 5.

Schematic illustration of reaction-assisted crystallization of a-TiO2 thin film on a Ni contact layer.

Image of FIG. 6.
FIG. 6.

XPS spectra of TiO2 thin films on Ni and NiO contact layers before and after annealing at 250 °C. Inset is the Ni 2p3/2 core level spectrum of the sample on Ni after annealing.

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/content/aip/journal/apl/101/5/10.1063/1.4739934
2012-07-30
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Metal-induced solid-phase crystallization of amorphous TiO2 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/101/5/10.1063/1.4739934
10.1063/1.4739934
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