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Schematic diagram of the simulated grating geometry, showing the xz coordinate system used, as well as the important parameters to be optimized.
Simulated (a) polarization ratio and (b) transmitted TM mode intensity ratio, using a fixed 150 nm period Al WGP, as a function of the metal-stripe width and the metal-film thickness. The dashed line indicates the 190 nm metal-film thickness selected for fabrication.
Schematic diagram of the process flow for the fabrication of the Al WGP LED.
Scanning electron microscopy (SEM) images of (a) patterned PMMA on top of the SiO2 layer; (b) patterned SiO2 on top of the Al layer; and (c) Al WGP on top of the sapphire substrate. The gratings have a period of 150 nm.
(a) Schematic illustration of the measurement setup; (b) measured EL intensity of the WGP LED as a function of the orientation angle of a rotating linear polarizer.
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