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High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography
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10.1063/1.4774298
/content/aip/journal/apl/102/1/10.1063/1.4774298
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/1/10.1063/1.4774298

Figures

Image of FIG. 1.
FIG. 1.

Angular dependences of the theoretical and experimental reflectance of the La/B4C multilayer at a wavelength λ = 6.661 nm (186.1 eV). Parameters of the multilayer structure as determined by X-ray diffraction at Cu K-α line are: period d = 3.35 nm, γLa = dLa/d = 0.5, the width of the transition region at the La-on-B4C is 0.75 nm and B4C-on-La is 0.35 nm, the densities of the materials are ρLa = 5.40 g/cm3 and ρB4C = 1.8 g/cm3.

Image of FIG. 2.
FIG. 2.

Angular dependence of the Rs-reflectivity of the La/B4C multilayer measured in the spectral range λ = 6.6–6.9 nm.

Image of FIG. 3.
FIG. 3.

Angular dependence of the Rs-reflectivity of the La/B4C/C multilayer measured in the spectral range λ = 6.6–6.9 nm.

Tables

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Table I.

Measured reflection characteristics of La/B4C/C multilayer structures in the spectral range λ = 6.6–6.9 nm.

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/content/aip/journal/apl/102/1/10.1063/1.4774298
2013-01-09
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/1/10.1063/1.4774298
10.1063/1.4774298
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