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Measured (dots) and linear fit (solid line) to the film thickness as a function of deposition time. The deposition rate in the linear growth region is found to be .
(a) XRD patterns using Cu K-α radiation of CrO2 (001) films with various thicknesses from 20 to 250 nm, showing the TiO2 and CrO2 rutile (002) peaks and (b) off-axis XRD patterns for rutile (101) peaks from the film and the substrate. Dotted lines represent the bulk peak positions for CrO2 (002) and (101) planes. No peaks were observed for angles omittedfrom the plot. (c) -scan of a 100 nm film when the film is tilted to the (101) planes.
Reduced magnetization-field curves measured with AGM at room temperature when the external field is applied (a) in-plane along the  direction, and (b) out-of-plane of CrO2 (001) films of various thickness. (c) Extracted (dots) and fitted (lines) of CrO2 (001) films of various thickness from 13 to 250 nm. These curves are used to determine K for each thickness, plotted in Fig. 4(b) .
(a) Saturation moment of CrO2 (001) films as a function of thickness. (b) Extracted (dots) and fitted (lines) non-shape anisotropy constants for CrO2 (001) films of various thickness from 13 to 250 nm. The first order anisotropy constant of bulk CrO2 is denoted by the dashed line.
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