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Hydrogen incorporation induced metal-semiconductor transition in ZnO:H thin films sputtered at room temperature
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10.1063/1.4803667
/content/aip/journal/apl/102/17/10.1063/1.4803667
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/17/10.1063/1.4803667
/content/aip/journal/apl/102/17/10.1063/1.4803667
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/content/aip/journal/apl/102/17/10.1063/1.4803667
2013-04-30
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen incorporation induced metal-semiconductor transition in ZnO:H thin films sputtered at room temperature
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/17/10.1063/1.4803667
10.1063/1.4803667
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