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(a) Top view of the optimized unit cell with . For these simulations, the dielectric nanostructure is surrounded on the top and bottom by air. (b) Electric field intensity distribution across four unit cells at the 3.3 μm resonance condition for normally incidence y-polarized plane wave in the xy-plane in the middle of the structure. (c) Electric field intensity distribution along two cuts in the yz-plane across two unit cells. The x-locations in the unit cell are shown with solid lines in (b). The top plot corresponds to the red line in (b), and the bottom plot corresponds to the white line in (b).
Simulations of the optimized metamaterial-enabled mirror coating. (a) Retrieved complex effective impedance and effective refractive index values. (b) Reflectance and transmittance at normal incidence.
(a) FESEM image of the nanofabricated subwavelength dielectric structure on a fused silica substrate. The high-index a-Si features are gray and the air gaps are black. Inset shows a high magnification image of one unit cell of the structure. Scale bar = 1 μm. (b) Simulated response including the effect of the fused silica substrate (dashed lines) and measured transmission and reflection spectra (solid lines).
(a) Photograph of the large-area, 2.54 cm × 2.54 cm, metamirror sample used for the uniformity measurements. (b) Average reflectance measured in nine regions of the large-area component.
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