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An in situ x-ray photoelectron spectroscopy study of the initial stages of rf magnetron sputter deposition of indium tin oxide on p-type Si substrate
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10.1063/1.4774404
/content/aip/journal/apl/102/2/10.1063/1.4774404
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/2/10.1063/1.4774404
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

The XPS spectra and peak fitting of the In , Sn , O 1s, and Si 2p peaks. The Si 2p spectra include insets. The intensities of some spectra are enhanced with the indicated factors.

Image of FIG. 2.
FIG. 2.

Energy filtered TEM images using the plasmon peak of (a) at 23 eV, and (b) for Si at 16 eV.

Image of FIG. 3.
FIG. 3.

SIMS of the ITO/Si interface and interfacial layer.

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/content/aip/journal/apl/102/2/10.1063/1.4774404
2013-01-17
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: An in situ x-ray photoelectron spectroscopy study of the initial stages of rf magnetron sputter deposition of indium tin oxide on p-type Si substrate
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/2/10.1063/1.4774404
10.1063/1.4774404
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