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Microscopic magnetic structuring of a spin-wave waveguide by ion implantation in a Ni81Fe19 layer
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Image of FIG. 1.
FIG. 1.

Schematic sample setup. A Ni81Fe19 film with a thickness of 20 nm is grown on top of a Si/SiO2 substrate. By localized implantation of ions, the magnetic properties of the implanted parts of the film are changed while a shielded region yields a 2 μm wide Ni81Fe19 stripe with unchanged properties embedded in the film. A subsequently produced Cu microwave antenna serves as excitation source for spin waves. The two measurement positions for the investigations from Fig. 2 are marked by a red and white circle, respectively. The external magnetic field is applied along the short axis of the Ni81Fe19 stripe.

Image of FIG. 2.
FIG. 2.

Experimentally observed spin-wave resonance spectra (left column) and calculated dispersion relations (right column) of magnetically patterned samples with different ion fluences compared to a topographically patterned reference sample. The resonance spectra have been recorded on the non-irradiated stripe (dotted lines) as well as on the implanted region of the film (solid lines) using Brillouin light scattering microscopy. The dashed lines in the left column indicate the frequency of the measurements in Fig. 3(a) . The right column contains fitting values for the internal magnetic field and the normalized saturation magnetization.

Image of FIG. 3.
FIG. 3.

(a) Color-coded spin-wave intensity distribution in the magnetically patterned Ni81Fe19 films and the reference waveguide. The position of the stripe with unchanged magnetic properties is indicated by the white dashed lines. Spin waves are excited by the antenna at . (b) Dependence of the width of the transverse spin-wave mode profiles on the spin-wave frequency. The width of the mode profiles has been measured by evaluating the FWHM. The experimental precision is indicated by the error bar.


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Scitation: Microscopic magnetic structuring of a spin-wave waveguide by ion implantation in a Ni81Fe19 layer