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A plot showing the leakage current as a function of time in Cu/ultra-low-k comb structure. The inset shows the top-down schematics of the comb structure used in the study.
In-situ FTIR spectroscopy on the Cu/ultra-low-k comb structure at different stress status.
Raman spectroscopy on the Cu/ultra-low-k comb structure at different stress status.
TEM cross-section images of the Cu/ultra-low-k comb structure for the original sample before stress (a) and the sample with a certain time of stress with leakage current (b). EDX line profile of the Ta migration along the interface of Cu/Ta/TaN/SiCOH before stress (c) and after stress (d), respectively.
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