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Effect of polarity on Ni/InN interfacial reactions
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10.1063/1.4781768
/content/aip/journal/apl/102/2/10.1063/1.4781768
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/2/10.1063/1.4781768
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Figures

Image of FIG. 1.
FIG. 1.

TEM images of Ni films on (a) In-face and (b) N-face InN with SAD of (c) In-face and (d) N-face InN for as-deposited samples. Each diffraction pattern consists of a set of diffraction spots from the single crystalline InN and diffraction rings from the polycrystalline Ni film.

Image of FIG. 2.
FIG. 2.

GIXRD patterns collected for (a) In-face Ni/InN samples and (b) N-face Ni/InN samples.

Image of FIG. 3.
FIG. 3.

TEM images of Ni films annealed at 673 K for 1 h on (a) In-face and (b) N-face InN along with SAD of the (c) In-face and (d) N-face InN samples. Diffraction spots are from InN, and rings are from the Ni-bearing layers.

Image of FIG. 4.
FIG. 4.

HAADF images for Ni films annealed for 1 h at 673 K on (a) In-face and (b) N-face InN highlight the difference in microstructure.

Image of FIG. 5.
FIG. 5.

XEDS spectra from annealed Ni films reveal only a Ni peak for the In-face sample while N and In peaks are also observed for the N-face sample.

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/content/aip/journal/apl/102/2/10.1063/1.4781768
2013-01-18
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of polarity on Ni/InN interfacial reactions
http://aip.metastore.ingenta.com/content/aip/journal/apl/102/2/10.1063/1.4781768
10.1063/1.4781768
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